Nanoridge patterns on polymeric film by a photodegradation copying method for metallic nanowire networks

Topographical patterns are widely applied in many manufacturing areas due to the unique role in modifying performance related to physical, chemical and biological fundamentals. The patterns are usually realized by buckling or wrinkling, self-assembly or epitaxy, and lithography techniques. However,...

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Detalles Bibliográficos
Autores principales: Wang, Jun, Zhang, Shuye, Shi, Zhiyuan, Jiu, Jinting, Wu, Chunhui, Sugahara, Tohru, Nagao, Shijo, Suganuma, Katsuaki, He, Peng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2018
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9091417/
https://www.ncbi.nlm.nih.gov/pubmed/35557918
http://dx.doi.org/10.1039/c8ra02249f

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9091417/
https://www.ncbi.nlm.nih.gov/pubmed/35557918
http://dx.doi.org/10.1039/c8ra02249f

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