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Nanoridge patterns on polymeric film by a photodegradation copying method for metallic nanowire networks
Topographical patterns are widely applied in many manufacturing areas due to the unique role in modifying performance related to physical, chemical and biological fundamentals. The patterns are usually realized by buckling or wrinkling, self-assembly or epitaxy, and lithography techniques. However,...
| Autores principales: | , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9091417/ https://www.ncbi.nlm.nih.gov/pubmed/35557918 http://dx.doi.org/10.1039/c8ra02249f |