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Long-Term Stability and Optoelectronic Performance Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer
[Image: see text] The influence of nanowire (NW) surface states increases rapidly with the reduction of diameter and hence severely degrades the optoelectronic performance of narrow-diameter NWs. Surface passivation is therefore critical, but it is challenging to achieve long-term effective passivat...
Autores principales: | , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2022
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9097579/ https://www.ncbi.nlm.nih.gov/pubmed/35420433 http://dx.doi.org/10.1021/acs.nanolett.2c00805 |
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author | Chen, LuLu Adeyemo, Stephanie O. Fonseka, H. Aruni Liu, Huiyun Kar, Srabani Yang, Hui Velichko, Anton Mowbray, David J. Cheng, Zhiyuan Sanchez, Ana M. Joyce, Hannah J Zhang, Yunyan |
author_facet | Chen, LuLu Adeyemo, Stephanie O. Fonseka, H. Aruni Liu, Huiyun Kar, Srabani Yang, Hui Velichko, Anton Mowbray, David J. Cheng, Zhiyuan Sanchez, Ana M. Joyce, Hannah J Zhang, Yunyan |
author_sort | Chen, LuLu |
collection | PubMed |
description | [Image: see text] The influence of nanowire (NW) surface states increases rapidly with the reduction of diameter and hence severely degrades the optoelectronic performance of narrow-diameter NWs. Surface passivation is therefore critical, but it is challenging to achieve long-term effective passivation without significantly affecting other qualities. Here, we demonstrate that an ultrathin InP passivation layer of 2–3 nm can effectively solve these challenges. For InAsP nanowires with small diameters of 30–40 nm, the ultrathin passivation layer reduces the surface recombination velocity by at least 70% and increases the charge carrier lifetime by a factor of 3. These improvements are maintained even after storing the samples in ambient atmosphere for over 3 years. This passivation also greatly improves the performance thermal tolerance of these thin NWs and extends their operating temperature from <150 K to room temperature. This study provides a new route toward high-performance room-temperature narrow-diameter NW devices with long-term stability. |
format | Online Article Text |
id | pubmed-9097579 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | American Chemical Society |
record_format | MEDLINE/PubMed |
spelling | pubmed-90975792022-05-13 Long-Term Stability and Optoelectronic Performance Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer Chen, LuLu Adeyemo, Stephanie O. Fonseka, H. Aruni Liu, Huiyun Kar, Srabani Yang, Hui Velichko, Anton Mowbray, David J. Cheng, Zhiyuan Sanchez, Ana M. Joyce, Hannah J Zhang, Yunyan Nano Lett [Image: see text] The influence of nanowire (NW) surface states increases rapidly with the reduction of diameter and hence severely degrades the optoelectronic performance of narrow-diameter NWs. Surface passivation is therefore critical, but it is challenging to achieve long-term effective passivation without significantly affecting other qualities. Here, we demonstrate that an ultrathin InP passivation layer of 2–3 nm can effectively solve these challenges. For InAsP nanowires with small diameters of 30–40 nm, the ultrathin passivation layer reduces the surface recombination velocity by at least 70% and increases the charge carrier lifetime by a factor of 3. These improvements are maintained even after storing the samples in ambient atmosphere for over 3 years. This passivation also greatly improves the performance thermal tolerance of these thin NWs and extends their operating temperature from <150 K to room temperature. This study provides a new route toward high-performance room-temperature narrow-diameter NW devices with long-term stability. American Chemical Society 2022-04-14 2022-04-27 /pmc/articles/PMC9097579/ /pubmed/35420433 http://dx.doi.org/10.1021/acs.nanolett.2c00805 Text en © 2022 American Chemical Society https://creativecommons.org/licenses/by/4.0/Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Chen, LuLu Adeyemo, Stephanie O. Fonseka, H. Aruni Liu, Huiyun Kar, Srabani Yang, Hui Velichko, Anton Mowbray, David J. Cheng, Zhiyuan Sanchez, Ana M. Joyce, Hannah J Zhang, Yunyan Long-Term Stability and Optoelectronic Performance Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer |
title | Long-Term Stability and Optoelectronic Performance
Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer |
title_full | Long-Term Stability and Optoelectronic Performance
Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer |
title_fullStr | Long-Term Stability and Optoelectronic Performance
Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer |
title_full_unstemmed | Long-Term Stability and Optoelectronic Performance
Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer |
title_short | Long-Term Stability and Optoelectronic Performance
Enhancement of InAsP Nanowires with an Ultrathin InP Passivation Layer |
title_sort | long-term stability and optoelectronic performance
enhancement of inasp nanowires with an ultrathin inp passivation layer |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9097579/ https://www.ncbi.nlm.nih.gov/pubmed/35420433 http://dx.doi.org/10.1021/acs.nanolett.2c00805 |
work_keys_str_mv | AT chenlulu longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT adeyemostephanieo longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT fonsekaharuni longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT liuhuiyun longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT karsrabani longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT yanghui longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT velichkoanton longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT mowbraydavidj longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT chengzhiyuan longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT sanchezanam longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT joycehannahj longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer AT zhangyunyan longtermstabilityandoptoelectronicperformanceenhancementofinaspnanowireswithanultrathininppassivationlayer |