Cargando…
Reduced Fermi Level Pinning at Physisorptive Sites of Moire-MoS(2)/Metal Schottky Barriers
[Image: see text] Weaker Fermi level pinning (FLP) at the Schottky barriers of 2D semiconductors is electrically desirable as this would allow a minimizing of contact resistances, which presently limit device performances. Existing contacts on MoS(2) have a strong FLP with a small pinning factor of...
Autores principales: | Zhang, Zhaofu, Guo, Yuzheng, Robertson, John |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2022
|
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9098114/ https://www.ncbi.nlm.nih.gov/pubmed/35220717 http://dx.doi.org/10.1021/acsami.1c23918 |
Ejemplares similares
-
Defect
Dominated Charge Transport and Fermi Level Pinning in MoS(2)/Metal Contacts
por: Bampoulis, Pantelis, et al.
Publicado: (2017) -
Controllable Schottky Barriers between MoS(2) and Permalloy
por: Wang, Weiyi, et al.
Publicado: (2014) -
Van der Waals metal-semiconductor junction: Weak Fermi level pinning enables effective tuning of Schottky barrier
por: Liu, Yuanyue, et al.
Publicado: (2016) -
Hydrogen physisorption based on the dissociative hydrogen chemisorption at the sulphur vacancy of MoS(2) surface
por: Han, Sang Wook, et al.
Publicado: (2017) -
Monolayer MoS(2) field effect transistor with low Schottky barrier height with ferromagnetic metal contacts
por: Gupta, Sachin, et al.
Publicado: (2019)