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The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation

The development of accident-tolerant materials is of great significance for preventing the zirconium–water reactions and improving the inherent safety of nuclear reactors. In this study, ZrC/Ni multilayers with average layer thicknesses of 5, 10, 20, 50, and 100 nm were designed and successfully fab...

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Detalles Bibliográficos
Autores principales: Jiang, Shengming, Zhu, Ruihua, Hu, Xiaotian, Zhang, Jian, Huang, Zijing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9101292/
https://www.ncbi.nlm.nih.gov/pubmed/35591394
http://dx.doi.org/10.3390/ma15093059
_version_ 1784707050329079808
author Jiang, Shengming
Zhu, Ruihua
Hu, Xiaotian
Zhang, Jian
Huang, Zijing
author_facet Jiang, Shengming
Zhu, Ruihua
Hu, Xiaotian
Zhang, Jian
Huang, Zijing
author_sort Jiang, Shengming
collection PubMed
description The development of accident-tolerant materials is of great significance for preventing the zirconium–water reactions and improving the inherent safety of nuclear reactors. In this study, ZrC/Ni multilayers with average layer thicknesses of 5, 10, 20, 50, and 100 nm were designed and successfully fabricated by magnetron sputtering. The characterization results of GIXRD, SEM, AFM, TEM, etc., show that the series of films are mainly composed of alternately deposited Ni crystalline layers and ZrC amorphous layers, and the interface is clear. The films were irradiated with 50 keV He(+) with a fluence of 1.0 × 10(17) ions/cm(2) at room temperature, and the films with different layer thicknesses kept the original phase composition. It was found that an amorphous transition layer with a thickness of about 30 nm appeared between the amorphous and crystalline interface of the 100 nm film by TEM characterization. The analysis shows that this layer is formed by the mixing of Ni and Zr elements induced by irradiation, which is not conducive to He(+) migration and produces large-sized helium bubbles. The appearance of the transition layer improves the irradiation stability of the amorphous/crystalline composite film, thus providing a theoretical basis for the application of this type of material in fuel cladding.
format Online
Article
Text
id pubmed-9101292
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-91012922022-05-14 The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation Jiang, Shengming Zhu, Ruihua Hu, Xiaotian Zhang, Jian Huang, Zijing Materials (Basel) Article The development of accident-tolerant materials is of great significance for preventing the zirconium–water reactions and improving the inherent safety of nuclear reactors. In this study, ZrC/Ni multilayers with average layer thicknesses of 5, 10, 20, 50, and 100 nm were designed and successfully fabricated by magnetron sputtering. The characterization results of GIXRD, SEM, AFM, TEM, etc., show that the series of films are mainly composed of alternately deposited Ni crystalline layers and ZrC amorphous layers, and the interface is clear. The films were irradiated with 50 keV He(+) with a fluence of 1.0 × 10(17) ions/cm(2) at room temperature, and the films with different layer thicknesses kept the original phase composition. It was found that an amorphous transition layer with a thickness of about 30 nm appeared between the amorphous and crystalline interface of the 100 nm film by TEM characterization. The analysis shows that this layer is formed by the mixing of Ni and Zr elements induced by irradiation, which is not conducive to He(+) migration and produces large-sized helium bubbles. The appearance of the transition layer improves the irradiation stability of the amorphous/crystalline composite film, thus providing a theoretical basis for the application of this type of material in fuel cladding. MDPI 2022-04-22 /pmc/articles/PMC9101292/ /pubmed/35591394 http://dx.doi.org/10.3390/ma15093059 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Jiang, Shengming
Zhu, Ruihua
Hu, Xiaotian
Zhang, Jian
Huang, Zijing
The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation
title The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation
title_full The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation
title_fullStr The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation
title_full_unstemmed The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation
title_short The Preparation of Amorphous ZrC/Nanocrystalline Ni Multilayers and the Resistance to He(+) Irradiation
title_sort preparation of amorphous zrc/nanocrystalline ni multilayers and the resistance to he(+) irradiation
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9101292/
https://www.ncbi.nlm.nih.gov/pubmed/35591394
http://dx.doi.org/10.3390/ma15093059
work_keys_str_mv AT jiangshengming thepreparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT zhuruihua thepreparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT huxiaotian thepreparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT zhangjian thepreparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT huangzijing thepreparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT jiangshengming preparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT zhuruihua preparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT huxiaotian preparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT zhangjian preparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation
AT huangzijing preparationofamorphouszrcnanocrystallinenimultilayersandtheresistancetoheirradiation