Cargando…
A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography
Silicon nanostructuring imparts unique material properties including antireflectivity, antifogging, anti-icing, self-cleaning, and/or antimicrobial activity. To tune these properties however, a good control over features’ size and shape is essential. Here, a versatile fabrication process is presente...
| Autores principales: | , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2022
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9115640/ https://www.ncbi.nlm.nih.gov/pubmed/35040848 http://dx.doi.org/10.1039/d1nr07024j |