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Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection

A new silicon-controlled rectifier embedded diode (SCR-D) for 7 nm bulk FinFET process electrostatic discharge (ESD) protection applications is proposed. The transmission line pulse (TLP) results show that the proposed device has a low turn-on voltage of 1.77 V. Compared with conventional SCR and di...

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Autores principales: Zhu, Xinyu, Dong, Shurong, Yu, Fangjun, Deng, Feifan, Shubhakar, Kalya, Pey, Kin Leong, Luo, Jikui
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9143253/
https://www.ncbi.nlm.nih.gov/pubmed/35630965
http://dx.doi.org/10.3390/nano12101743
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author Zhu, Xinyu
Dong, Shurong
Yu, Fangjun
Deng, Feifan
Shubhakar, Kalya
Pey, Kin Leong
Luo, Jikui
author_facet Zhu, Xinyu
Dong, Shurong
Yu, Fangjun
Deng, Feifan
Shubhakar, Kalya
Pey, Kin Leong
Luo, Jikui
author_sort Zhu, Xinyu
collection PubMed
description A new silicon-controlled rectifier embedded diode (SCR-D) for 7 nm bulk FinFET process electrostatic discharge (ESD) protection applications is proposed. The transmission line pulse (TLP) results show that the proposed device has a low turn-on voltage of 1.77 V. Compared with conventional SCR and diode string, the proposed SCR-D has an additional conduction path constituting by two additional inherent diodes, which results in a 1.8-to-2.2-times current surge capability as compared with the simple diode string and conventional SCR with the same size. The results show that the proposed device meets the 7 nm FinFET process ESD design window and has already been applied in actual circuits.
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spelling pubmed-91432532022-05-29 Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection Zhu, Xinyu Dong, Shurong Yu, Fangjun Deng, Feifan Shubhakar, Kalya Pey, Kin Leong Luo, Jikui Nanomaterials (Basel) Article A new silicon-controlled rectifier embedded diode (SCR-D) for 7 nm bulk FinFET process electrostatic discharge (ESD) protection applications is proposed. The transmission line pulse (TLP) results show that the proposed device has a low turn-on voltage of 1.77 V. Compared with conventional SCR and diode string, the proposed SCR-D has an additional conduction path constituting by two additional inherent diodes, which results in a 1.8-to-2.2-times current surge capability as compared with the simple diode string and conventional SCR with the same size. The results show that the proposed device meets the 7 nm FinFET process ESD design window and has already been applied in actual circuits. MDPI 2022-05-19 /pmc/articles/PMC9143253/ /pubmed/35630965 http://dx.doi.org/10.3390/nano12101743 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Zhu, Xinyu
Dong, Shurong
Yu, Fangjun
Deng, Feifan
Shubhakar, Kalya
Pey, Kin Leong
Luo, Jikui
Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection
title Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection
title_full Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection
title_fullStr Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection
title_full_unstemmed Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection
title_short Silicon-Controlled Rectifier Embedded Diode for 7 nm FinFET Process Electrostatic Discharge Protection
title_sort silicon-controlled rectifier embedded diode for 7 nm finfet process electrostatic discharge protection
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9143253/
https://www.ncbi.nlm.nih.gov/pubmed/35630965
http://dx.doi.org/10.3390/nano12101743
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