Cargando…

Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide

Cost-effective, practical, and efficiently performing photosensitive resin composite materials are essential, as the current materials are expensive, lack better alternatives, and do not meet 3D printing standards. In this study, based on orthogonal experiments for photosensitive resin curing, we pr...

Descripción completa

Detalles Bibliográficos
Autores principales: Huang, Lijie, Wang, Yanan, Wei, Zhehao, Han, Xiaoxue, Mo, Qi, Wang, Xiyue, Li, Yishan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9145890/
https://www.ncbi.nlm.nih.gov/pubmed/35631849
http://dx.doi.org/10.3390/polym14101959
_version_ 1784716426381099008
author Huang, Lijie
Wang, Yanan
Wei, Zhehao
Han, Xiaoxue
Mo, Qi
Wang, Xiyue
Li, Yishan
author_facet Huang, Lijie
Wang, Yanan
Wei, Zhehao
Han, Xiaoxue
Mo, Qi
Wang, Xiyue
Li, Yishan
author_sort Huang, Lijie
collection PubMed
description Cost-effective, practical, and efficiently performing photosensitive resin composite materials are essential, as the current materials are expensive, lack better alternatives, and do not meet 3D printing standards. In this study, based on orthogonal experiments for photosensitive resin curing, we prepared a free-radical/cationic hybrid photosensitive UV cured resin (UVR) using acrylic ester and epoxy resin as the prepolymers, tripropylenediol diacrylate (TPGDA) as the active diluent, and triaryl sulfonium salt (I-160) and 2,2-dimethyl-α-hydroxy acetophenone (1173) as the photoinitiators, in the optimized formula of acrylic-ester:epoxy-resin:TPGDA:I-160:1173 = 37.5:37.5:20:2.5:2.5. Further, we investigated the effects of polyurethane acrylates (PUA) and Graphene oxide (GO) on the surface morphology, chemical structure, hydrophobicity, mechanical strength, and gelation rate of the hybrid resin. We observed that 20% PUA improved tensile strength to the maximum of 36.89 MPa from 16.42 MPa of the unmodified hybrid resin, whereas 1% GO reduced volume shrinkage to the minimum of 2.89% from 3.73% of the unmodified hybrid resin. These photosensitive resins with higher tensile strength and lower volume shrinkage can be used to synthesize high performance functional materials in the future.
format Online
Article
Text
id pubmed-9145890
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-91458902022-05-29 Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide Huang, Lijie Wang, Yanan Wei, Zhehao Han, Xiaoxue Mo, Qi Wang, Xiyue Li, Yishan Polymers (Basel) Article Cost-effective, practical, and efficiently performing photosensitive resin composite materials are essential, as the current materials are expensive, lack better alternatives, and do not meet 3D printing standards. In this study, based on orthogonal experiments for photosensitive resin curing, we prepared a free-radical/cationic hybrid photosensitive UV cured resin (UVR) using acrylic ester and epoxy resin as the prepolymers, tripropylenediol diacrylate (TPGDA) as the active diluent, and triaryl sulfonium salt (I-160) and 2,2-dimethyl-α-hydroxy acetophenone (1173) as the photoinitiators, in the optimized formula of acrylic-ester:epoxy-resin:TPGDA:I-160:1173 = 37.5:37.5:20:2.5:2.5. Further, we investigated the effects of polyurethane acrylates (PUA) and Graphene oxide (GO) on the surface morphology, chemical structure, hydrophobicity, mechanical strength, and gelation rate of the hybrid resin. We observed that 20% PUA improved tensile strength to the maximum of 36.89 MPa from 16.42 MPa of the unmodified hybrid resin, whereas 1% GO reduced volume shrinkage to the minimum of 2.89% from 3.73% of the unmodified hybrid resin. These photosensitive resins with higher tensile strength and lower volume shrinkage can be used to synthesize high performance functional materials in the future. MDPI 2022-05-12 /pmc/articles/PMC9145890/ /pubmed/35631849 http://dx.doi.org/10.3390/polym14101959 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Huang, Lijie
Wang, Yanan
Wei, Zhehao
Han, Xiaoxue
Mo, Qi
Wang, Xiyue
Li, Yishan
Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide
title Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide
title_full Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide
title_fullStr Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide
title_full_unstemmed Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide
title_short Synthesis and Optimization of a Free-Radical/Cationic Hybrid Photosensitive UV Curable Resin Using Polyurethane Acrylate and Graphene Oxide
title_sort synthesis and optimization of a free-radical/cationic hybrid photosensitive uv curable resin using polyurethane acrylate and graphene oxide
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9145890/
https://www.ncbi.nlm.nih.gov/pubmed/35631849
http://dx.doi.org/10.3390/polym14101959
work_keys_str_mv AT huanglijie synthesisandoptimizationofafreeradicalcationichybridphotosensitiveuvcurableresinusingpolyurethaneacrylateandgrapheneoxide
AT wangyanan synthesisandoptimizationofafreeradicalcationichybridphotosensitiveuvcurableresinusingpolyurethaneacrylateandgrapheneoxide
AT weizhehao synthesisandoptimizationofafreeradicalcationichybridphotosensitiveuvcurableresinusingpolyurethaneacrylateandgrapheneoxide
AT hanxiaoxue synthesisandoptimizationofafreeradicalcationichybridphotosensitiveuvcurableresinusingpolyurethaneacrylateandgrapheneoxide
AT moqi synthesisandoptimizationofafreeradicalcationichybridphotosensitiveuvcurableresinusingpolyurethaneacrylateandgrapheneoxide
AT wangxiyue synthesisandoptimizationofafreeradicalcationichybridphotosensitiveuvcurableresinusingpolyurethaneacrylateandgrapheneoxide
AT liyishan synthesisandoptimizationofafreeradicalcationichybridphotosensitiveuvcurableresinusingpolyurethaneacrylateandgrapheneoxide