Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution

A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of Pyrus communis L. by 35–44%, and the diam...

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Detalles Bibliográficos
Autores principales: Konchekov, Evgeny M., Kolik, Leonid V., Danilejko, Yury K., Belov, Sergey V., Artem’ev, Konstantin V., Astashev, Maxim E., Pavlik, Tatiana I., Lukanin, Vladimir I., Kutyrev, Alexey I., Smirnov, Igor G., Gudkov, Sergey V.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9146419/
https://www.ncbi.nlm.nih.gov/pubmed/35631800
http://dx.doi.org/10.3390/plants11101373
Descripción
Sumario:A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of Pyrus communis L. by 35–44%, and the diameter of the root collar by 10–28%. In this case, the electrical resistivity of the graft decreased by 20–48%, which indicated the formation of a more developed vascular system at the rootstock–scion interface. The characteristics of DBD CAP and PTS are described in detail.

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