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Synthesis and Characterization of Nanostructured Multi-Layer Cr/SnO(2)/NiO/Cr Coatings Prepared via E-Beam Evaporation Technique for Metal-Insulator-Insulator-Metal Diodes

Enhanced non-linearity and asymmetric behavior of the Cr/metal oxide diode is reported, with the addition of two insulator layers of SnO(2) and NiO to form the metal-insulator-insulator-metal (MIIM) configuration. Such an MIIM diode shows potential for various applications (rectifiers and electronic...

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Detalles Bibliográficos
Autores principales: Abrar, Sana, Hanif, Muhammad Bilal, Alghamdi, Abdulaziz Salem, Khaliq, Abdul, Abdel Halim, K. S., Subhani, Tayyab, Motola, Martin, Khan, Abdul Faheem
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9182535/
https://www.ncbi.nlm.nih.gov/pubmed/35683204
http://dx.doi.org/10.3390/ma15113906
Descripción
Sumario:Enhanced non-linearity and asymmetric behavior of the Cr/metal oxide diode is reported, with the addition of two insulator layers of SnO(2) and NiO to form the metal-insulator-insulator-metal (MIIM) configuration. Such an MIIM diode shows potential for various applications (rectifiers and electronic equipment) which enable the femtosecond fast intoxication in MIIM diodes. In this work, nanostructured multi-layer Cr/SnO(2)/NiO/Cr coatings were fabricated via e-beam evaporation with the following thicknesses: 150 nm/20 nm/10 nm/150 nm. Coatings were characterized via Rutherford backscattering (RBS), scanning electron microscopy (SEM), and two-probe conductivity testing. RBS confirmed the layered structure and optimal stoichiometry of the coatings. A non-linear and asymmetric behavior at <1.5 V applied bias with the non-linearity maximum of 2.6 V(−1) and the maximum sensitivity of 9.0 V(−1) at the DC bias point was observed. The promising performance of the coating is due to two insulating layers which enables resonant tunneling and/or step-tunneling. Based on the properties, the present multi-layer coatings can be employed for MIIM application.