Atomic Layer Deposition of Intermetallic Fe(4)Zn(9) Thin Films from Diethyl Zinc

[Image: see text] We present a new type of atomic layer deposition (ALD) process for intermetallic thin films, where diethyl zinc (DEZ) serves as a coreactant. In our proof-of-concept study, FeCl(3) is used as the second precursor. The FeCl(3) + DEZ process yields in situ crystalline Fe(4)Zn(9) thin...

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Detalles Bibliográficos
Autores principales: Ghiyasi, Ramin, Philip, Anish, Liu, Ji, Julin, Jaakko, Sajavaara, Timo, Nolan, Michael, Karppinen, Maarit
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9202305/
https://www.ncbi.nlm.nih.gov/pubmed/35722201
http://dx.doi.org/10.1021/acs.chemmater.2c00907

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9202305/
https://www.ncbi.nlm.nih.gov/pubmed/35722201
http://dx.doi.org/10.1021/acs.chemmater.2c00907

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