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In Vitro Biodegradation of a-C:H:SiO(x) Films on Ti-6Al-4V Alloy

This paper focuses mainly on the in vitro study of a five-week biodegradation of a-C:H:SiO(x) films of different thickness, obtained by plasma-assisted chemical vapor deposition onto Ti-6Al-4V alloy substrate using its pulsed bipolar biasing. In vitro immersion of a-C:H:SiO(x) films in a solution of...

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Detalles Bibliográficos
Autores principales: Grenadyorov, Alexander, Solovyev, Andrey, Oskomov, Konstantin, Porokhova, Ekaterina, Brazovskii, Konstantin, Gorokhova, Anna, Nasibov, Temur, Litvinova, Larisa, Khlusov, Igor
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9231245/
https://www.ncbi.nlm.nih.gov/pubmed/35744297
http://dx.doi.org/10.3390/ma15124239
Descripción
Sumario:This paper focuses mainly on the in vitro study of a five-week biodegradation of a-C:H:SiO(x) films of different thickness, obtained by plasma-assisted chemical vapor deposition onto Ti-6Al-4V alloy substrate using its pulsed bipolar biasing. In vitro immersion of a-C:H:SiO(x) films in a solution of 0.9% NaCl was used. It is shown how the a-C:H:SiO(x) film thickness (0.5–3 µm) affects the surface morphology, adhesive strength, and Na(+) and Cl(−) precipitation on the film surface from the NaCl solution. With increasing film thickness, the roughness indices are reducing a little. The adhesive strength of the a-C:H:SiO(x) films to metal substrate corresponds to quality HF1 (0.5 µm in thickness) and HF2-HF3 (1.5–3 µm in thickness) of the Rockwell hardness test (VDI 3198) that defines strong interfacial adhesion and is usually applied in practice. The morphometric analysis of the film surface shows that on a-C:H:SiO(x)-coated Ti-6Al-4V alloy surface, the area occupied by the grains of sodium chloride is lower than on the uncoated surface. The reduction in the ion precipitation from 0.9% NaCl onto the film surface depended on the elemental composition of the surface layer conditioned by the thickness growth of the a-C:H:SiO(x) film. Based on the results of energy dispersive X-ray spectroscopy, the multiple regression equations are suggested to explain the effect of the elemental composition of the a-C:H:SiO(x) film on the decreased Na(+) and Cl(−) precipitation. As a result, the a-C:H:SiO(x) films successfully combine good adhesion strength and rare ion precipitation and thus are rather promising for medical applications on cardiovascular stents and/or friction parts of heart pumps.