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Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering

For neuromorphic computing and high-density data storage memory, memristive devices have recently gained a lot of interest. So far, memristive devices have suffered from switching parameter instability, such as distortions in resistance values of low- and high-resistance states (LRSs and HRSs), disp...

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Autores principales: Ismail, Muhammad, Mahata, Chandreswar, Kang, Myounggon, Kim, Sungjun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9232664/
https://www.ncbi.nlm.nih.gov/pubmed/35749003
http://dx.doi.org/10.1186/s11671-022-03699-z
_version_ 1784735638491234304
author Ismail, Muhammad
Mahata, Chandreswar
Kang, Myounggon
Kim, Sungjun
author_facet Ismail, Muhammad
Mahata, Chandreswar
Kang, Myounggon
Kim, Sungjun
author_sort Ismail, Muhammad
collection PubMed
description For neuromorphic computing and high-density data storage memory, memristive devices have recently gained a lot of interest. So far, memristive devices have suffered from switching parameter instability, such as distortions in resistance values of low- and high-resistance states (LRSs and HRSs), dispersion in working voltage (set and reset voltages), and a small ratio of high and low resistance, among other issues. In this context, interface engineering is a critical technique for addressing the variation issues that obstruct the use of memristive devices. Herein, we engineered a high band gap, low Gibbs free energy Al(2)O(3) interlayer between the HfO(2) switching layer and the tantalum oxy-nitride electrode (TaN) bottom electrode to operate as an oxygen reservoir, increasing the resistance ratio between HRS and LRS and enabling multilayer data storage. The Pt/HfO(2)/Al(2)O(3)/TaN memristive device demonstrates analog bipolar resistive switching behavior with a potential ratio of HRS and LRS of > 10(5) and the ability to store multi-level data with consistent retention and uniformity. On set and reset voltages, statistical analysis is used; the mean values (µ) of set and reset voltages are determined to be − 2.7 V and + 1.9 V, respectively. There is a repeatable durability over DC 1000 cycles, 10(5) AC cycles, and a retention time of 10(4) s at room temperature. Quantum conductance was obtained by increasing the reset voltage with step of 0.005 V with delay time of 0.1 s. Memristive device has also displayed synaptic properties like as potentiation/depression and paired-pulse facilitation (PPF). Results show that engineering of interlayer is an effective approach to improve the uniformity, ratio of high and low resistance, and multiple conductance quantization states and paves the way for research into neuromorphic synapses. SUPPLEMENTARY INFORMATION: The online version contains supplementary material available at 10.1186/s11671-022-03699-z.
format Online
Article
Text
id pubmed-9232664
institution National Center for Biotechnology Information
language English
publishDate 2022
publisher Springer US
record_format MEDLINE/PubMed
spelling pubmed-92326642022-06-26 Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering Ismail, Muhammad Mahata, Chandreswar Kang, Myounggon Kim, Sungjun Nanoscale Res Lett Research For neuromorphic computing and high-density data storage memory, memristive devices have recently gained a lot of interest. So far, memristive devices have suffered from switching parameter instability, such as distortions in resistance values of low- and high-resistance states (LRSs and HRSs), dispersion in working voltage (set and reset voltages), and a small ratio of high and low resistance, among other issues. In this context, interface engineering is a critical technique for addressing the variation issues that obstruct the use of memristive devices. Herein, we engineered a high band gap, low Gibbs free energy Al(2)O(3) interlayer between the HfO(2) switching layer and the tantalum oxy-nitride electrode (TaN) bottom electrode to operate as an oxygen reservoir, increasing the resistance ratio between HRS and LRS and enabling multilayer data storage. The Pt/HfO(2)/Al(2)O(3)/TaN memristive device demonstrates analog bipolar resistive switching behavior with a potential ratio of HRS and LRS of > 10(5) and the ability to store multi-level data with consistent retention and uniformity. On set and reset voltages, statistical analysis is used; the mean values (µ) of set and reset voltages are determined to be − 2.7 V and + 1.9 V, respectively. There is a repeatable durability over DC 1000 cycles, 10(5) AC cycles, and a retention time of 10(4) s at room temperature. Quantum conductance was obtained by increasing the reset voltage with step of 0.005 V with delay time of 0.1 s. Memristive device has also displayed synaptic properties like as potentiation/depression and paired-pulse facilitation (PPF). Results show that engineering of interlayer is an effective approach to improve the uniformity, ratio of high and low resistance, and multiple conductance quantization states and paves the way for research into neuromorphic synapses. SUPPLEMENTARY INFORMATION: The online version contains supplementary material available at 10.1186/s11671-022-03699-z. Springer US 2022-06-24 /pmc/articles/PMC9232664/ /pubmed/35749003 http://dx.doi.org/10.1186/s11671-022-03699-z Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Research
Ismail, Muhammad
Mahata, Chandreswar
Kang, Myounggon
Kim, Sungjun
Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering
title Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering
title_full Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering
title_fullStr Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering
title_full_unstemmed Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering
title_short Robust Resistive Switching Constancy and Quantum Conductance in High-k Dielectric-Based Memristor for Neuromorphic Engineering
title_sort robust resistive switching constancy and quantum conductance in high-k dielectric-based memristor for neuromorphic engineering
topic Research
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9232664/
https://www.ncbi.nlm.nih.gov/pubmed/35749003
http://dx.doi.org/10.1186/s11671-022-03699-z
work_keys_str_mv AT ismailmuhammad robustresistiveswitchingconstancyandquantumconductanceinhighkdielectricbasedmemristorforneuromorphicengineering
AT mahatachandreswar robustresistiveswitchingconstancyandquantumconductanceinhighkdielectricbasedmemristorforneuromorphicengineering
AT kangmyounggon robustresistiveswitchingconstancyandquantumconductanceinhighkdielectricbasedmemristorforneuromorphicengineering
AT kimsungjun robustresistiveswitchingconstancyandquantumconductanceinhighkdielectricbasedmemristorforneuromorphicengineering