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Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors

Due to their outstanding power density, long cycle life and low cost, supercapacitors have gained much interest. As for supercapacitor electrodes, molybdenum nitrides show promising potential. Molybdenum nitrides, however, are mainly prepared as nanopowders via a chemical route and require binders f...

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Autores principales: Govindarajan, Durai, Palaniyandy, Nithyadharseni, Chinnakutti, Karthik Kumar, Nguyen, Mai Thanh, Yonezawa, Tetsu, Qin, Jiaqian, Kheawhom, Soorathep
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9296755/
https://www.ncbi.nlm.nih.gov/pubmed/35852712
http://dx.doi.org/10.1186/s11671-022-03704-5
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author Govindarajan, Durai
Palaniyandy, Nithyadharseni
Chinnakutti, Karthik Kumar
Nguyen, Mai Thanh
Yonezawa, Tetsu
Qin, Jiaqian
Kheawhom, Soorathep
author_facet Govindarajan, Durai
Palaniyandy, Nithyadharseni
Chinnakutti, Karthik Kumar
Nguyen, Mai Thanh
Yonezawa, Tetsu
Qin, Jiaqian
Kheawhom, Soorathep
author_sort Govindarajan, Durai
collection PubMed
description Due to their outstanding power density, long cycle life and low cost, supercapacitors have gained much interest. As for supercapacitor electrodes, molybdenum nitrides show promising potential. Molybdenum nitrides, however, are mainly prepared as nanopowders via a chemical route and require binders for the manufacture of electrodes. Such electrodes can impair the performance of supercapacitors. Herein, binder-free chromium (Cr)-doped molybdenum nitride (Mo(2)N) TFEs having different Cr concentrations are prepared via a reactive co-sputtering technique. The Cr-doped Mo(2)N films prepared have a cubic phase structure of γ-Mo(2)N with a minor shift in the (111) plane. While un-doped Mo(2)N films exhibit a spherical morphology, Cr-doped Mo(2)N films demonstrate a clear pyramid-like surface morphology. The developed Cr-doped Mo(2)N films contain 0–7.9 at.% of Cr in Mo(2)N lattice. A supercapacitor using a Cr-doped Mo(2)N electrode having the highest concentration of Cr reveals maximum areal capacity of 2780 mC/cm(2), which is much higher than that of an un-doped Mo(2)N electrode (110 mC/cm(2)). Furthermore, the Cr-doped Mo(2)N electrode demonstrates excellent cycling stability, achieving ~ 94.6% capacity retention for about 2000 cycles. The reactive co-sputtering proves to be a suitable technique for fabrication of binder-free TFEs for high-performance energy storage device applications. GRAPHICAL ABSTRACT: [Image: see text] SUPPLEMENTARY INFORMATION: The online version contains supplementary material available at 10.1186/s11671-022-03704-5.
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spelling pubmed-92967552022-07-21 Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors Govindarajan, Durai Palaniyandy, Nithyadharseni Chinnakutti, Karthik Kumar Nguyen, Mai Thanh Yonezawa, Tetsu Qin, Jiaqian Kheawhom, Soorathep Nanoscale Res Lett Research Due to their outstanding power density, long cycle life and low cost, supercapacitors have gained much interest. As for supercapacitor electrodes, molybdenum nitrides show promising potential. Molybdenum nitrides, however, are mainly prepared as nanopowders via a chemical route and require binders for the manufacture of electrodes. Such electrodes can impair the performance of supercapacitors. Herein, binder-free chromium (Cr)-doped molybdenum nitride (Mo(2)N) TFEs having different Cr concentrations are prepared via a reactive co-sputtering technique. The Cr-doped Mo(2)N films prepared have a cubic phase structure of γ-Mo(2)N with a minor shift in the (111) plane. While un-doped Mo(2)N films exhibit a spherical morphology, Cr-doped Mo(2)N films demonstrate a clear pyramid-like surface morphology. The developed Cr-doped Mo(2)N films contain 0–7.9 at.% of Cr in Mo(2)N lattice. A supercapacitor using a Cr-doped Mo(2)N electrode having the highest concentration of Cr reveals maximum areal capacity of 2780 mC/cm(2), which is much higher than that of an un-doped Mo(2)N electrode (110 mC/cm(2)). Furthermore, the Cr-doped Mo(2)N electrode demonstrates excellent cycling stability, achieving ~ 94.6% capacity retention for about 2000 cycles. The reactive co-sputtering proves to be a suitable technique for fabrication of binder-free TFEs for high-performance energy storage device applications. GRAPHICAL ABSTRACT: [Image: see text] SUPPLEMENTARY INFORMATION: The online version contains supplementary material available at 10.1186/s11671-022-03704-5. Springer US 2022-07-19 /pmc/articles/PMC9296755/ /pubmed/35852712 http://dx.doi.org/10.1186/s11671-022-03704-5 Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Research
Govindarajan, Durai
Palaniyandy, Nithyadharseni
Chinnakutti, Karthik Kumar
Nguyen, Mai Thanh
Yonezawa, Tetsu
Qin, Jiaqian
Kheawhom, Soorathep
Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors
title Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors
title_full Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors
title_fullStr Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors
title_full_unstemmed Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors
title_short Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo(2)N TFEs for High-Performance Supercapacitors
title_sort sputter-deposited binder-free nanopyramidal cr/γ-mo(2)n tfes for high-performance supercapacitors
topic Research
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9296755/
https://www.ncbi.nlm.nih.gov/pubmed/35852712
http://dx.doi.org/10.1186/s11671-022-03704-5
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