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Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment
Skin diseases such as atopic dermatitis (AD) are widespread and affect people all over the world. Current treatments for dry and itchy skin are mostly focused on pharmaceutical solutions, while supportive therapies such as ointments bring immediate relief. Electrospun membranes are commonly used as...
Autores principales: | , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9320356/ https://www.ncbi.nlm.nih.gov/pubmed/35890388 http://dx.doi.org/10.3390/pharmaceutics14071494 |
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author | Krysiak, Zuzanna J. Stachewicz, Urszula |
author_facet | Krysiak, Zuzanna J. Stachewicz, Urszula |
author_sort | Krysiak, Zuzanna J. |
collection | PubMed |
description | Skin diseases such as atopic dermatitis (AD) are widespread and affect people all over the world. Current treatments for dry and itchy skin are mostly focused on pharmaceutical solutions, while supportive therapies such as ointments bring immediate relief. Electrospun membranes are commonly used as a drug delivery system, as they have a high surface to volume area, resulting in high loading capacity. Within this study we present the manufacturing strategies of skin patches using polymer membranes with active substances for treating various skin problems. Here, we manufactured the skin patches using electrospun poly(vinyl butyral-co-vinyl alcohol-co-vinyl acetate) (PVB) fibers blended and electrosprayed with urea. The highest cumulative release of urea was obtained from the PVB patches manufactured via blend electrospinning with 5% of the urea incorporated in the fiber. The maximum concentration of released urea was acquired after 30 min, which was followed up by 6 h of constant release level. The simultaneous electrospinning and electrospraying limited the urea deposition and resulted in the lowest urea incorporation followed by the low release level. The urea-based patches, manufactured via blend electrospinning, exhibited a great potential as overnight treatment for various skin problems and their development can bring new trends to the textile-based therapies for AD. |
format | Online Article Text |
id | pubmed-9320356 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-93203562022-07-27 Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment Krysiak, Zuzanna J. Stachewicz, Urszula Pharmaceutics Article Skin diseases such as atopic dermatitis (AD) are widespread and affect people all over the world. Current treatments for dry and itchy skin are mostly focused on pharmaceutical solutions, while supportive therapies such as ointments bring immediate relief. Electrospun membranes are commonly used as a drug delivery system, as they have a high surface to volume area, resulting in high loading capacity. Within this study we present the manufacturing strategies of skin patches using polymer membranes with active substances for treating various skin problems. Here, we manufactured the skin patches using electrospun poly(vinyl butyral-co-vinyl alcohol-co-vinyl acetate) (PVB) fibers blended and electrosprayed with urea. The highest cumulative release of urea was obtained from the PVB patches manufactured via blend electrospinning with 5% of the urea incorporated in the fiber. The maximum concentration of released urea was acquired after 30 min, which was followed up by 6 h of constant release level. The simultaneous electrospinning and electrospraying limited the urea deposition and resulted in the lowest urea incorporation followed by the low release level. The urea-based patches, manufactured via blend electrospinning, exhibited a great potential as overnight treatment for various skin problems and their development can bring new trends to the textile-based therapies for AD. MDPI 2022-07-19 /pmc/articles/PMC9320356/ /pubmed/35890388 http://dx.doi.org/10.3390/pharmaceutics14071494 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Krysiak, Zuzanna J. Stachewicz, Urszula Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment |
title | Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment |
title_full | Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment |
title_fullStr | Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment |
title_full_unstemmed | Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment |
title_short | Urea-Based Patches with Controlled Release for Potential Atopic Dermatitis Treatment |
title_sort | urea-based patches with controlled release for potential atopic dermatitis treatment |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9320356/ https://www.ncbi.nlm.nih.gov/pubmed/35890388 http://dx.doi.org/10.3390/pharmaceutics14071494 |
work_keys_str_mv | AT krysiakzuzannaj ureabasedpatcheswithcontrolledreleaseforpotentialatopicdermatitistreatment AT stachewiczurszula ureabasedpatcheswithcontrolledreleaseforpotentialatopicdermatitistreatment |