Optimization of the Growth Process of Double Perovskite Pr(2−δ)Ni(1−x)Mn(1+x)O(6−y) Epitaxial Thin Films by RF Sputtering

Epitaxial thin films of Pr(2−δ)Ni(1−x)Mn(1+x)O(6−y) (PNMO) double perovskite were grown on (001)-oriented SrTiO(3) substrates by RF magnetron sputtering. The influence of the growth parameters (oxygen pressure, substrate temperature, and annealing treatments) on the structural, magnetic and transport properties, and stoichiometry of the films was thoroughly investigated. It is found that high-quality epitaxial, insulating, and ferromagnetic PNMO thin films can only be obtained in a narrow deposition parameter window. It is shown that a careful selection of the growth conditions allows for obtaining a high degree of Ni/Mn cation ordering, which is reflected in the values of the Curie temperature, T(C), and saturation magnetization, M(S), which are very close to those of bulk material.