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Interfacial Delamination at Multilayer Thin Films in Semiconductor Devices

[Image: see text] With the evolution of semiconducting industries, thermomechanical failure induced in a multilayered structure with a high aspect ratio during manufacturing and operation has become one of the critical reliability issues. In this work, the effect of thermomechanical stress on the fa...

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Detalles Bibliográficos
Autores principales: Kim, Jin-Hoon, Kil, Hye-Jun, Lee, Sangjun, Park, Jinwoo, Park, Jin-Woo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9330259/
https://www.ncbi.nlm.nih.gov/pubmed/35910113
http://dx.doi.org/10.1021/acsomega.2c02122

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