Concurrent Enhancement of Breakdown Strength and Dielectric Constant in Poly(vinylidene Fluoride) Film with High Energy Storage Density by Ultraviolet Irradiation

[Image: see text] Polyvinylidene fluoride (PVDF) film with high energy storage density has exhibited great potential for applications in modern electronics, particle accelerators, and pulsed lasers. Typically, dielectric/ferroelectric properties of PVDF film have been tailored for energy storage through stretching, annealing, and defect modification. Here, PVDF films were prepared by the solution casting method followed by an ultraviolet (UV) irradiation process, with special emphasis on how such treatment influences their dielectric and energy storage properties. Upon UV irradiation, the dielectric constant and breakdown strength of the PVDF film were enhanced simultaneously. A high energy density of 18.6 J/cm(3), along with a charge–discharge efficiency of 81% at 600 MV/m, was achieved in PVDF after exposure to UV for 15 min. This work may provide a simple and yet effective route to enhance energy storage density of PVDF-based polymers.