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Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications

The uneven deposition at the edges of an evaporating droplet, termed the coffee-ring effect, has been extensively studied during the past few decades to better understand the underlying cause, namely the flow dynamics, and the subsequent patterns formed after drying. The non-uniform evaporation rate...

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Detalles Bibliográficos
Autores principales: Lee, Saebom, A. M., Tiara, Cho, Gyoujin, Lee, Jinkee
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9370329/
https://www.ncbi.nlm.nih.gov/pubmed/35957030
http://dx.doi.org/10.3390/nano12152600
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author Lee, Saebom
A. M., Tiara
Cho, Gyoujin
Lee, Jinkee
author_facet Lee, Saebom
A. M., Tiara
Cho, Gyoujin
Lee, Jinkee
author_sort Lee, Saebom
collection PubMed
description The uneven deposition at the edges of an evaporating droplet, termed the coffee-ring effect, has been extensively studied during the past few decades to better understand the underlying cause, namely the flow dynamics, and the subsequent patterns formed after drying. The non-uniform evaporation rate across the colloidal droplet hampers the formation of a uniform and homogeneous film in printed electronics, rechargeable batteries, etc., and often causes device failures. This review aims to highlight the diverse range of techniques used to alleviate the coffee-ring effect, from classic methods such as adding chemical additives, applying external sources, and manipulating geometrical configurations to recently developed advancements, specifically using bubbles, humidity, confined systems, etc., which do not involve modification of surface, particle or liquid properties. Each of these methodologies mitigates the edge deposition via multi-body interactions, for example, particle–liquid, particle-particle, particle–solid interfaces and particle–flow interactions. The mechanisms behind each of these approaches help to find methods to inhibit the non-uniform film formation, and the corresponding applications have been discussed together with a critical comparison in detail. This review could pave the way for developing inks and processes to apply in functional coatings and printed electronic devices with improved efficiency and device yield.
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spelling pubmed-93703292022-08-12 Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications Lee, Saebom A. M., Tiara Cho, Gyoujin Lee, Jinkee Nanomaterials (Basel) Review The uneven deposition at the edges of an evaporating droplet, termed the coffee-ring effect, has been extensively studied during the past few decades to better understand the underlying cause, namely the flow dynamics, and the subsequent patterns formed after drying. The non-uniform evaporation rate across the colloidal droplet hampers the formation of a uniform and homogeneous film in printed electronics, rechargeable batteries, etc., and often causes device failures. This review aims to highlight the diverse range of techniques used to alleviate the coffee-ring effect, from classic methods such as adding chemical additives, applying external sources, and manipulating geometrical configurations to recently developed advancements, specifically using bubbles, humidity, confined systems, etc., which do not involve modification of surface, particle or liquid properties. Each of these methodologies mitigates the edge deposition via multi-body interactions, for example, particle–liquid, particle-particle, particle–solid interfaces and particle–flow interactions. The mechanisms behind each of these approaches help to find methods to inhibit the non-uniform film formation, and the corresponding applications have been discussed together with a critical comparison in detail. This review could pave the way for developing inks and processes to apply in functional coatings and printed electronic devices with improved efficiency and device yield. MDPI 2022-07-28 /pmc/articles/PMC9370329/ /pubmed/35957030 http://dx.doi.org/10.3390/nano12152600 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Review
Lee, Saebom
A. M., Tiara
Cho, Gyoujin
Lee, Jinkee
Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications
title Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications
title_full Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications
title_fullStr Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications
title_full_unstemmed Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications
title_short Control of the Drying Patterns for Complex Colloidal Solutions and Their Applications
title_sort control of the drying patterns for complex colloidal solutions and their applications
topic Review
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9370329/
https://www.ncbi.nlm.nih.gov/pubmed/35957030
http://dx.doi.org/10.3390/nano12152600
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