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Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators

Nanomechanical resonators made from van der Waals materials (vdW NMRs) provide a new tool for sensing absorbed laser power. The photothermal response of vdW NMRs, quantified from the resonant frequency shifts induced by optical absorption, is enhanced when incorporated in a Fabry–Pérot (FP) interfer...

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Autores principales: Aguila, Myrron Albert Callera, Esmenda, Joshoua Condicion, Wang, Jyh-Yang, Chen, Yen-Chun, Lee, Teik-Hui, Yang, Chi-Yuan, Lin, Kung-Hsuan, Chang-Liao, Kuei-Shu, Kafanov, Sergey, Pashkin, Yuri A., Chen, Chii-Dong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9370576/
https://www.ncbi.nlm.nih.gov/pubmed/35957105
http://dx.doi.org/10.3390/nano12152675
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author Aguila, Myrron Albert Callera
Esmenda, Joshoua Condicion
Wang, Jyh-Yang
Chen, Yen-Chun
Lee, Teik-Hui
Yang, Chi-Yuan
Lin, Kung-Hsuan
Chang-Liao, Kuei-Shu
Kafanov, Sergey
Pashkin, Yuri A.
Chen, Chii-Dong
author_facet Aguila, Myrron Albert Callera
Esmenda, Joshoua Condicion
Wang, Jyh-Yang
Chen, Yen-Chun
Lee, Teik-Hui
Yang, Chi-Yuan
Lin, Kung-Hsuan
Chang-Liao, Kuei-Shu
Kafanov, Sergey
Pashkin, Yuri A.
Chen, Chii-Dong
author_sort Aguila, Myrron Albert Callera
collection PubMed
description Nanomechanical resonators made from van der Waals materials (vdW NMRs) provide a new tool for sensing absorbed laser power. The photothermal response of vdW NMRs, quantified from the resonant frequency shifts induced by optical absorption, is enhanced when incorporated in a Fabry–Pérot (FP) interferometer. Along with the enhancement comes the dependence of the photothermal response on NMR displacement, which lacks investigation. Here, we address the knowledge gap by studying electromotively driven niobium diselenide drumheads fabricated on highly reflective substrates. We use a FP-mediated absorptive heating model to explain the measured variations of the photothermal response. The model predicts a higher magnitude and tuning range of photothermal responses on few-layer and monolayer NbSe(2) drumheads, which outperform other clamped vdW drum-type NMRs at a laser wavelength of 532 nm. Further analysis of the model shows that both the magnitude and tuning range of NbSe(2) drumheads scale with thickness, establishing a displacement-based framework for building bolometers using FP-mediated vdW NMRs.
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spelling pubmed-93705762022-08-12 Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators Aguila, Myrron Albert Callera Esmenda, Joshoua Condicion Wang, Jyh-Yang Chen, Yen-Chun Lee, Teik-Hui Yang, Chi-Yuan Lin, Kung-Hsuan Chang-Liao, Kuei-Shu Kafanov, Sergey Pashkin, Yuri A. Chen, Chii-Dong Nanomaterials (Basel) Article Nanomechanical resonators made from van der Waals materials (vdW NMRs) provide a new tool for sensing absorbed laser power. The photothermal response of vdW NMRs, quantified from the resonant frequency shifts induced by optical absorption, is enhanced when incorporated in a Fabry–Pérot (FP) interferometer. Along with the enhancement comes the dependence of the photothermal response on NMR displacement, which lacks investigation. Here, we address the knowledge gap by studying electromotively driven niobium diselenide drumheads fabricated on highly reflective substrates. We use a FP-mediated absorptive heating model to explain the measured variations of the photothermal response. The model predicts a higher magnitude and tuning range of photothermal responses on few-layer and monolayer NbSe(2) drumheads, which outperform other clamped vdW drum-type NMRs at a laser wavelength of 532 nm. Further analysis of the model shows that both the magnitude and tuning range of NbSe(2) drumheads scale with thickness, establishing a displacement-based framework for building bolometers using FP-mediated vdW NMRs. MDPI 2022-08-04 /pmc/articles/PMC9370576/ /pubmed/35957105 http://dx.doi.org/10.3390/nano12152675 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Aguila, Myrron Albert Callera
Esmenda, Joshoua Condicion
Wang, Jyh-Yang
Chen, Yen-Chun
Lee, Teik-Hui
Yang, Chi-Yuan
Lin, Kung-Hsuan
Chang-Liao, Kuei-Shu
Kafanov, Sergey
Pashkin, Yuri A.
Chen, Chii-Dong
Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators
title Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators
title_full Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators
title_fullStr Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators
title_full_unstemmed Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators
title_short Photothermal Responsivity of van der Waals Material-Based Nanomechanical Resonators
title_sort photothermal responsivity of van der waals material-based nanomechanical resonators
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9370576/
https://www.ncbi.nlm.nih.gov/pubmed/35957105
http://dx.doi.org/10.3390/nano12152675
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