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Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films

Partially fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe 1, Ni 2, Cu 3, Zn 4; tfac = 1,1,1-trifluoro-2,4-pentanedionate; TMEDA = N,N,N′,N′-tetramethylethylenediamine) were synthesized and structurally (sc-XRD) and thermochemically (TGA) characterised. A new polymorph of Fe(tfac)(2)(TME...

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Autores principales: Stienen, Christian, Grahl, Julian, Wölper, Christoph, Schulz, Stephan, Bendt, Georg
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9379779/
https://www.ncbi.nlm.nih.gov/pubmed/36105963
http://dx.doi.org/10.1039/d2ra01338j
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author Stienen, Christian
Grahl, Julian
Wölper, Christoph
Schulz, Stephan
Bendt, Georg
author_facet Stienen, Christian
Grahl, Julian
Wölper, Christoph
Schulz, Stephan
Bendt, Georg
author_sort Stienen, Christian
collection PubMed
description Partially fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe 1, Ni 2, Cu 3, Zn 4; tfac = 1,1,1-trifluoro-2,4-pentanedionate; TMEDA = N,N,N′,N′-tetramethylethylenediamine) were synthesized and structurally (sc-XRD) and thermochemically (TGA) characterised. A new polymorph of Fe(tfac)(2)(TMEDA) was found. The structural and physicochemical properties of 1–4 were compared with related M(acac)(2)(TMEDA) and M(hfac)(2)(TMEDA) (acac = 2,4-pentanedionate, hfac = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate) β-diketonate complexes to evaluate the effect of the degree of fluorination. A positive effect on the thermal behaviour of the metal acetylacetonates was observed, but no discernible trends. Application of complexes 1–4 as precursors in a MOCVD process yielded either metal (Ni, Cu) or metal oxide thin films (Fe(3)O(4), ZnO), which were further oxidized to NiO, CuO and α-Fe(2)O(3) films by calcination in air at 500 °C.
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spelling pubmed-93797792022-09-13 Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films Stienen, Christian Grahl, Julian Wölper, Christoph Schulz, Stephan Bendt, Georg RSC Adv Chemistry Partially fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe 1, Ni 2, Cu 3, Zn 4; tfac = 1,1,1-trifluoro-2,4-pentanedionate; TMEDA = N,N,N′,N′-tetramethylethylenediamine) were synthesized and structurally (sc-XRD) and thermochemically (TGA) characterised. A new polymorph of Fe(tfac)(2)(TMEDA) was found. The structural and physicochemical properties of 1–4 were compared with related M(acac)(2)(TMEDA) and M(hfac)(2)(TMEDA) (acac = 2,4-pentanedionate, hfac = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate) β-diketonate complexes to evaluate the effect of the degree of fluorination. A positive effect on the thermal behaviour of the metal acetylacetonates was observed, but no discernible trends. Application of complexes 1–4 as precursors in a MOCVD process yielded either metal (Ni, Cu) or metal oxide thin films (Fe(3)O(4), ZnO), which were further oxidized to NiO, CuO and α-Fe(2)O(3) films by calcination in air at 500 °C. The Royal Society of Chemistry 2022-08-16 /pmc/articles/PMC9379779/ /pubmed/36105963 http://dx.doi.org/10.1039/d2ra01338j Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/
spellingShingle Chemistry
Stienen, Christian
Grahl, Julian
Wölper, Christoph
Schulz, Stephan
Bendt, Georg
Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films
title Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films
title_full Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films
title_fullStr Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films
title_full_unstemmed Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films
title_short Fluorinated β-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films
title_sort fluorinated β-diketonate complexes m(tfac)(2)(tmeda) (m = fe, ni, cu, zn) as precursors for the mocvd growth of metal and metal oxide thin films
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9379779/
https://www.ncbi.nlm.nih.gov/pubmed/36105963
http://dx.doi.org/10.1039/d2ra01338j
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