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Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction
A vertical GaN power MOSFET featuring an integrated fin-shaped non-junction diode (FDMOS) is proposed to improve reverse conduction and switching characteristics. Its static and dynamic characteristics are studied and analyzed by Sentaurus TCAD simulation. Compared with the conventional MOSFET (Con....
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9402820/ https://www.ncbi.nlm.nih.gov/pubmed/36001155 http://dx.doi.org/10.1186/s11671-022-03717-0 |
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author | Sun, Tao Luo, Xiaorong Wei, Jie Yang, Kemeng Deng, Siyu Zhao, Zhijia Jia, Yanjiang Zhang, Bo |
author_facet | Sun, Tao Luo, Xiaorong Wei, Jie Yang, Kemeng Deng, Siyu Zhao, Zhijia Jia, Yanjiang Zhang, Bo |
author_sort | Sun, Tao |
collection | PubMed |
description | A vertical GaN power MOSFET featuring an integrated fin-shaped non-junction diode (FDMOS) is proposed to improve reverse conduction and switching characteristics. Its static and dynamic characteristics are studied and analyzed by Sentaurus TCAD simulation. Compared with the conventional MOSFET (Con. MOS) with a body diode as a freewheeling diode (FWD), the FDMOS uses the integrated fin-shaped diode to reverse conduction, and thus, a low reverse turn-on voltage V(ON) of 0.66 V is achieved, with a decreasing of 77.9%. Moreover, the Q(rr) of the FDMOS is reduced to 1.36 μC from 1.64 μC of the Con. MOS, without the minority carrier injection. The gate charge (Q(GD)) of the FDMOS is significantly reduced because the fin structure reduces the gate area and transforms some part of C(GD) to C(GS), and thus, a low switching loss is realized. The Q(GD), the turn-on loss (E(on)) and the turn-off loss (E(off)) of the FDMOS are decreased by 56.8%, 33.8% and 53.8%, respectively, compared with those of the Con. MOS. In addition, the FDMOS is beneficial to reduce the parasitic inductance and the total chip area compared with the conventional method of using an externally connected Schottky diode as an FWD. |
format | Online Article Text |
id | pubmed-9402820 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | Springer US |
record_format | MEDLINE/PubMed |
spelling | pubmed-94028202022-08-26 Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction Sun, Tao Luo, Xiaorong Wei, Jie Yang, Kemeng Deng, Siyu Zhao, Zhijia Jia, Yanjiang Zhang, Bo Nanoscale Res Lett Research A vertical GaN power MOSFET featuring an integrated fin-shaped non-junction diode (FDMOS) is proposed to improve reverse conduction and switching characteristics. Its static and dynamic characteristics are studied and analyzed by Sentaurus TCAD simulation. Compared with the conventional MOSFET (Con. MOS) with a body diode as a freewheeling diode (FWD), the FDMOS uses the integrated fin-shaped diode to reverse conduction, and thus, a low reverse turn-on voltage V(ON) of 0.66 V is achieved, with a decreasing of 77.9%. Moreover, the Q(rr) of the FDMOS is reduced to 1.36 μC from 1.64 μC of the Con. MOS, without the minority carrier injection. The gate charge (Q(GD)) of the FDMOS is significantly reduced because the fin structure reduces the gate area and transforms some part of C(GD) to C(GS), and thus, a low switching loss is realized. The Q(GD), the turn-on loss (E(on)) and the turn-off loss (E(off)) of the FDMOS are decreased by 56.8%, 33.8% and 53.8%, respectively, compared with those of the Con. MOS. In addition, the FDMOS is beneficial to reduce the parasitic inductance and the total chip area compared with the conventional method of using an externally connected Schottky diode as an FWD. Springer US 2022-08-24 /pmc/articles/PMC9402820/ /pubmed/36001155 http://dx.doi.org/10.1186/s11671-022-03717-0 Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) . |
spellingShingle | Research Sun, Tao Luo, Xiaorong Wei, Jie Yang, Kemeng Deng, Siyu Zhao, Zhijia Jia, Yanjiang Zhang, Bo Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction |
title | Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction |
title_full | Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction |
title_fullStr | Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction |
title_full_unstemmed | Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction |
title_short | Vertical GaN Power MOSFET with Integrated Fin-Shaped Diode for Reverse Conduction |
title_sort | vertical gan power mosfet with integrated fin-shaped diode for reverse conduction |
topic | Research |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9402820/ https://www.ncbi.nlm.nih.gov/pubmed/36001155 http://dx.doi.org/10.1186/s11671-022-03717-0 |
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