Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

[Image: see text] A series of t-butyloxycarbonyl (t-Boc) protected tetraphenylsilane derivatives (TPSi-Boc(x), x = 60, 70, 85, 100%) were synthesized and used as resist materials to investigate the effect of t-Boc protecting ratio on advanced lithography. The physical properties such as solubility,...

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Detalles Bibliográficos
Autores principales: Wang, Yake, Chen, Jinping, Zeng, Yi, Yu, Tianjun, Guo, Xudong, Wang, Shuangqing, Allenet, Timothée, Vockenhuber, Michaela, Ekinci, Yasin, Zhao, Jun, Yang, Shumin, Wu, Yanqing, Yang, Guoqiang, Li, Yi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9404489/
https://www.ncbi.nlm.nih.gov/pubmed/36033723
http://dx.doi.org/10.1021/acsomega.2c03445

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