Cargando…
Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO(x) Films at Different Substrate Temperatures
The promising functional tin oxide (SnO(x)) has attracted tremendous attention due to its transparent and conductive properties. The stoichiometric composition of SnO(x) can be described as common n-type SnO(2) and p-type Sn(3)O(4). In this study, the functional SnO(x) films were prepared successful...
Autores principales: | Huang, Pao-Hsun, Zhang, Zhi-Xuan, Hsu, Chia-Hsun, Wu, Wan-Yu, Ou, Sin-Liang, Huang, Chien-Jung, Wuu, Dong-Sing, Lien, Shui-Yang, Zhu, Wen-Zhang |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9416374/ https://www.ncbi.nlm.nih.gov/pubmed/36014724 http://dx.doi.org/10.3390/nano12162859 |
Ejemplares similares
-
Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO(2) Thin Films via Atomic Layer Deposition
por: Huang, Pao-Hsun, et al.
Publicado: (2021) -
Compact Ga(2)O(3) Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature
por: Yang, Yue, et al.
Publicado: (2022) -
Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures
por: Ren, Fang-Bin, et al.
Publicado: (2022) -
Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture
por: Jiang, Shicong, et al.
Publicado: (2022) -
Zinc Oxide Films with High Transparency and Crystallinity Prepared by a Low Temperature Spatial Atomic Layer Deposition Process
por: Zhao, Ming-Jie, et al.
Publicado: (2020)