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Ice-assisted electron-beam lithography for MoS(2) transistors with extremely low-energy electrons
Ice-assisted electron-beam lithography (iEBL) by patterning ice with a focused electron-beam has emerged as a green nanofabrication technique for building nanostructures on diverse substrates. However, materials like atomically thin molybdenum disulfide (MoS(2)), can be easily damaged by electron ir...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
RSC
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417924/ https://www.ncbi.nlm.nih.gov/pubmed/36134129 http://dx.doi.org/10.1039/d2na00159d |