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Ice-assisted electron-beam lithography for MoS(2) transistors with extremely low-energy electrons

Ice-assisted electron-beam lithography (iEBL) by patterning ice with a focused electron-beam has emerged as a green nanofabrication technique for building nanostructures on diverse substrates. However, materials like atomically thin molybdenum disulfide (MoS(2)), can be easily damaged by electron ir...

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Detalles Bibliográficos
Autores principales:	Yao, Guangnan, Zhao, Ding, Hong, Yu, Zheng, Rui, Qiu, Min
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	RSC 2022
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9417924/ https://www.ncbi.nlm.nih.gov/pubmed/36134129 http://dx.doi.org/10.1039/d2na00159d

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