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Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography

Solid state nanopores are central structures for many applications. To date, much effort has been spent on controlled fabrication of single nanopores, while relatively little work has focused on large scale fabrication of arrays of nanopores. In this work we show wafer-scale fabrication of plasmonic...

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Autores principales: Malekian, Bita, Xiong, Kunli, Kang, Evan S. H., Andersson, John, Emilsson, Gustav, Rommel, Marcus, Sannomiya, Takumi, Jonsson, Magnus P., Dahlin, Andreas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418017/
https://www.ncbi.nlm.nih.gov/pubmed/36134417
http://dx.doi.org/10.1039/c9na00585d
_version_ 1784776854479044608
author Malekian, Bita
Xiong, Kunli
Kang, Evan S. H.
Andersson, John
Emilsson, Gustav
Rommel, Marcus
Sannomiya, Takumi
Jonsson, Magnus P.
Dahlin, Andreas
author_facet Malekian, Bita
Xiong, Kunli
Kang, Evan S. H.
Andersson, John
Emilsson, Gustav
Rommel, Marcus
Sannomiya, Takumi
Jonsson, Magnus P.
Dahlin, Andreas
author_sort Malekian, Bita
collection PubMed
description Solid state nanopores are central structures for many applications. To date, much effort has been spent on controlled fabrication of single nanopores, while relatively little work has focused on large scale fabrication of arrays of nanopores. In this work we show wafer-scale fabrication of plasmonic nanopores in 50 nm thick silicon nitride membranes with one or two 30 nm gold films, using electron beam lithography with a negative resist or a new version of colloidal lithography. Both approaches offer good control of pore diameter (even below 100 nm) and with high yield (>90%) of intact membranes. Colloidal lithography has the advantage of parallel patterning without expensive equipment. Despite its serial nature, electron beam lithography provides high throughput and can make arbitrary array patterns. Importantly, both methods prevent metal from ending up on the membrane pore sidewalls. The new fabrication methods make it possible to compare the optical properties of structurally identical plasmonic nanopore arrays with either long-range order (e-beam) or short-range order (colloidal). The resonance features in the extinction spectrum are very similar for both structures when the pitch is the same as the characteristic spacing in the self-assembled colloidal pattern. Long-range ordering slightly enhances the magnitude of the extinction maximum and blueshift the transmission maximum by tens of nm. Upon reducing the diameter in long-range ordered arrays, the resonance is reduced in magnitude and the transmission maximum is further blue shifted, just like for short-range ordered arrays. These effects are well explained by interpreting the spectra as Fano interference between the grating-type excitation of propagating surface plasmons and the broad transmission via individual pores in the metal film. Furthermore, we find that only the short-range ordered arrays scatter light, which we attribute to the highly limited effective period in the short-range ordered system and the corresponding lack of coherent suppression of scattering by interference effects.
format Online
Article
Text
id pubmed-9418017
institution National Center for Biotechnology Information
language English
publishDate 2019
publisher RSC
record_format MEDLINE/PubMed
spelling pubmed-94180172022-09-20 Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography Malekian, Bita Xiong, Kunli Kang, Evan S. H. Andersson, John Emilsson, Gustav Rommel, Marcus Sannomiya, Takumi Jonsson, Magnus P. Dahlin, Andreas Nanoscale Adv Chemistry Solid state nanopores are central structures for many applications. To date, much effort has been spent on controlled fabrication of single nanopores, while relatively little work has focused on large scale fabrication of arrays of nanopores. In this work we show wafer-scale fabrication of plasmonic nanopores in 50 nm thick silicon nitride membranes with one or two 30 nm gold films, using electron beam lithography with a negative resist or a new version of colloidal lithography. Both approaches offer good control of pore diameter (even below 100 nm) and with high yield (>90%) of intact membranes. Colloidal lithography has the advantage of parallel patterning without expensive equipment. Despite its serial nature, electron beam lithography provides high throughput and can make arbitrary array patterns. Importantly, both methods prevent metal from ending up on the membrane pore sidewalls. The new fabrication methods make it possible to compare the optical properties of structurally identical plasmonic nanopore arrays with either long-range order (e-beam) or short-range order (colloidal). The resonance features in the extinction spectrum are very similar for both structures when the pitch is the same as the characteristic spacing in the self-assembled colloidal pattern. Long-range ordering slightly enhances the magnitude of the extinction maximum and blueshift the transmission maximum by tens of nm. Upon reducing the diameter in long-range ordered arrays, the resonance is reduced in magnitude and the transmission maximum is further blue shifted, just like for short-range ordered arrays. These effects are well explained by interpreting the spectra as Fano interference between the grating-type excitation of propagating surface plasmons and the broad transmission via individual pores in the metal film. Furthermore, we find that only the short-range ordered arrays scatter light, which we attribute to the highly limited effective period in the short-range ordered system and the corresponding lack of coherent suppression of scattering by interference effects. RSC 2019-10-07 /pmc/articles/PMC9418017/ /pubmed/36134417 http://dx.doi.org/10.1039/c9na00585d Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by/3.0/
spellingShingle Chemistry
Malekian, Bita
Xiong, Kunli
Kang, Evan S. H.
Andersson, John
Emilsson, Gustav
Rommel, Marcus
Sannomiya, Takumi
Jonsson, Magnus P.
Dahlin, Andreas
Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography
title Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography
title_full Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography
title_fullStr Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography
title_full_unstemmed Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography
title_short Optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography
title_sort optical properties of plasmonic nanopore arrays prepared by electron beam and colloidal lithography
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418017/
https://www.ncbi.nlm.nih.gov/pubmed/36134417
http://dx.doi.org/10.1039/c9na00585d
work_keys_str_mv AT malekianbita opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT xiongkunli opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT kangevansh opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT anderssonjohn opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT emilssongustav opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT rommelmarcus opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT sannomiyatakumi opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT jonssonmagnusp opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography
AT dahlinandreas opticalpropertiesofplasmonicnanoporearrayspreparedbyelectronbeamandcolloidallithography