Aluminium metal–insulator–metal structure fabricated by the bottom-up approach

Plasmonic color is an elegant color resulting from light absorption and emission induced by collective oscillation of free electrons in a metal and enables unprecedented new color expression. In particular, Al plasmonic color is highly desirable because of the low cost and high stability of Al. Here...

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Detalles Bibliográficos
Autores principales: Watanabe, Rie, Mita, Mai, Okamoto, Takayuki, Isobe, Toshihiro, Nakajima, Akira, Matsushita, Sachiko
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2020
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418675/
https://www.ncbi.nlm.nih.gov/pubmed/36133391
http://dx.doi.org/10.1039/d0na00082e
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author Watanabe, Rie
Mita, Mai
Okamoto, Takayuki
Isobe, Toshihiro
Nakajima, Akira
Matsushita, Sachiko
author_facet Watanabe, Rie
Mita, Mai
Okamoto, Takayuki
Isobe, Toshihiro
Nakajima, Akira
Matsushita, Sachiko
author_sort Watanabe, Rie
collection PubMed
description Plasmonic color is an elegant color resulting from light absorption and emission induced by collective oscillation of free electrons in a metal and enables unprecedented new color expression. In particular, Al plasmonic color is highly desirable because of the low cost and high stability of Al. Here, we report a new cost-effective, wide-area fabrication method for an Al metal–insulator–metal (MIM) plasmonic nanostructure using a vapor deposition and sintering process.
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spelling pubmed-94186752022-09-20 Aluminium metal–insulator–metal structure fabricated by the bottom-up approach Watanabe, Rie Mita, Mai Okamoto, Takayuki Isobe, Toshihiro Nakajima, Akira Matsushita, Sachiko Nanoscale Adv Chemistry Plasmonic color is an elegant color resulting from light absorption and emission induced by collective oscillation of free electrons in a metal and enables unprecedented new color expression. In particular, Al plasmonic color is highly desirable because of the low cost and high stability of Al. Here, we report a new cost-effective, wide-area fabrication method for an Al metal–insulator–metal (MIM) plasmonic nanostructure using a vapor deposition and sintering process. RSC 2020-04-20 /pmc/articles/PMC9418675/ /pubmed/36133391 http://dx.doi.org/10.1039/d0na00082e Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/
spellingShingle Chemistry
Watanabe, Rie
Mita, Mai
Okamoto, Takayuki
Isobe, Toshihiro
Nakajima, Akira
Matsushita, Sachiko
Aluminium metal–insulator–metal structure fabricated by the bottom-up approach
title Aluminium metal–insulator–metal structure fabricated by the bottom-up approach
title_full Aluminium metal–insulator–metal structure fabricated by the bottom-up approach
title_fullStr Aluminium metal–insulator–metal structure fabricated by the bottom-up approach
title_full_unstemmed Aluminium metal–insulator–metal structure fabricated by the bottom-up approach
title_short Aluminium metal–insulator–metal structure fabricated by the bottom-up approach
title_sort aluminium metal–insulator–metal structure fabricated by the bottom-up approach
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9418675/
https://www.ncbi.nlm.nih.gov/pubmed/36133391
http://dx.doi.org/10.1039/d0na00082e
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