AC parallel local oxidation of silicon

Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiO(x) with a controlled roughne...

Descripción completa

Detalles Bibliográficos
Autores principales: Hemmatian, Zahra, Gentili, Denis, Barbalinardo, Marianna, Morandi, Vittorio, Ortolani, Luca, Ruani, Giampiero, Cavallini, Massimiliano
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2019
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419026/
https://www.ncbi.nlm.nih.gov/pubmed/36132101
http://dx.doi.org/10.1039/c9na00445a
Descripción
Sumario:Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiO(x) with a controlled roughness. Besides, we proved the repeatability of AC-PLON and its integrability with conventional parallel local oxidation nanolithography.

Ejemplares similares