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AC parallel local oxidation of silicon

Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiO(x) with a controlled roughne...

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Detalles Bibliográficos
Autores principales: Hemmatian, Zahra, Gentili, Denis, Barbalinardo, Marianna, Morandi, Vittorio, Ortolani, Luca, Ruani, Giampiero, Cavallini, Massimiliano
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419026/
https://www.ncbi.nlm.nih.gov/pubmed/36132101
http://dx.doi.org/10.1039/c9na00445a
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author Hemmatian, Zahra
Gentili, Denis
Barbalinardo, Marianna
Morandi, Vittorio
Ortolani, Luca
Ruani, Giampiero
Cavallini, Massimiliano
author_facet Hemmatian, Zahra
Gentili, Denis
Barbalinardo, Marianna
Morandi, Vittorio
Ortolani, Luca
Ruani, Giampiero
Cavallini, Massimiliano
author_sort Hemmatian, Zahra
collection PubMed
description Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiO(x) with a controlled roughness. Besides, we proved the repeatability of AC-PLON and its integrability with conventional parallel local oxidation nanolithography.
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spelling pubmed-94190262022-09-20 AC parallel local oxidation of silicon Hemmatian, Zahra Gentili, Denis Barbalinardo, Marianna Morandi, Vittorio Ortolani, Luca Ruani, Giampiero Cavallini, Massimiliano Nanoscale Adv Chemistry Here, we present a suitable advancement of parallel local oxidation nanolithography, demonstrating its feasibility in alternate current mode (AC-PLON). For demonstration, we fabricated model structures consisting of an array of parallel nanostripes of electrochemical SiO(x) with a controlled roughness. Besides, we proved the repeatability of AC-PLON and its integrability with conventional parallel local oxidation nanolithography. RSC 2019-09-03 /pmc/articles/PMC9419026/ /pubmed/36132101 http://dx.doi.org/10.1039/c9na00445a Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/
spellingShingle Chemistry
Hemmatian, Zahra
Gentili, Denis
Barbalinardo, Marianna
Morandi, Vittorio
Ortolani, Luca
Ruani, Giampiero
Cavallini, Massimiliano
AC parallel local oxidation of silicon
title AC parallel local oxidation of silicon
title_full AC parallel local oxidation of silicon
title_fullStr AC parallel local oxidation of silicon
title_full_unstemmed AC parallel local oxidation of silicon
title_short AC parallel local oxidation of silicon
title_sort ac parallel local oxidation of silicon
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419026/
https://www.ncbi.nlm.nih.gov/pubmed/36132101
http://dx.doi.org/10.1039/c9na00445a
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