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Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films
Epitaxial films of piezoelectric α-quartz could enable the fabrication of sensors with unprecedented sensitivity for prospective applications in electronics, biology and medicine. However, the prerequisites are harnessing the crystallization of epitaxial α-quartz and tailoring suitable film microstr...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
RSC
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419616/ https://www.ncbi.nlm.nih.gov/pubmed/36133542 http://dx.doi.org/10.1039/c9na00388f |
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author | Zhang, Qianzhe Sánchez-Fuentes, David Gómez, Andrés Desgarceaux, Rudy Charlot, Benoit Gàzquez, Jaume Carretero-Genevrier, Adrián Gich, Martí |
author_facet | Zhang, Qianzhe Sánchez-Fuentes, David Gómez, Andrés Desgarceaux, Rudy Charlot, Benoit Gàzquez, Jaume Carretero-Genevrier, Adrián Gich, Martí |
author_sort | Zhang, Qianzhe |
collection | PubMed |
description | Epitaxial films of piezoelectric α-quartz could enable the fabrication of sensors with unprecedented sensitivity for prospective applications in electronics, biology and medicine. However, the prerequisites are harnessing the crystallization of epitaxial α-quartz and tailoring suitable film microstructures for nanostructuration. Here, we bring new insights into the crystallization of epitaxial α-quartz films on silicon (100) from the devitrification of porous silica and the control of the film microstructures: we show that by increasing the quantity of devitrifying agent (Sr) it is possible to switch from an α-quartz microstructure consisting of a porous flat film to one dominated by larger, fully dense α-quartz crystals. We also found that the film thickness, relative humidity and the nature of the surfactant play an important role in the control of the microstructure and homogeneity of the films. Via a multi-layer deposition method, we have extended the maximum thickness of the α-quartz films from a few hundreds of nm to the μm range. Moreover, we found a convenient method to combine this multilayer approach with soft lithography to pattern silica films while preserving epitaxial crystallization. This improved control over crystallization and the possibility of preparing patterned films of epitaxial α-quartz on Si substrates pave the path to future developments in applications based on electromechanics, optics and optomechanics. |
format | Online Article Text |
id | pubmed-9419616 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | RSC |
record_format | MEDLINE/PubMed |
spelling | pubmed-94196162022-09-20 Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films Zhang, Qianzhe Sánchez-Fuentes, David Gómez, Andrés Desgarceaux, Rudy Charlot, Benoit Gàzquez, Jaume Carretero-Genevrier, Adrián Gich, Martí Nanoscale Adv Chemistry Epitaxial films of piezoelectric α-quartz could enable the fabrication of sensors with unprecedented sensitivity for prospective applications in electronics, biology and medicine. However, the prerequisites are harnessing the crystallization of epitaxial α-quartz and tailoring suitable film microstructures for nanostructuration. Here, we bring new insights into the crystallization of epitaxial α-quartz films on silicon (100) from the devitrification of porous silica and the control of the film microstructures: we show that by increasing the quantity of devitrifying agent (Sr) it is possible to switch from an α-quartz microstructure consisting of a porous flat film to one dominated by larger, fully dense α-quartz crystals. We also found that the film thickness, relative humidity and the nature of the surfactant play an important role in the control of the microstructure and homogeneity of the films. Via a multi-layer deposition method, we have extended the maximum thickness of the α-quartz films from a few hundreds of nm to the μm range. Moreover, we found a convenient method to combine this multilayer approach with soft lithography to pattern silica films while preserving epitaxial crystallization. This improved control over crystallization and the possibility of preparing patterned films of epitaxial α-quartz on Si substrates pave the path to future developments in applications based on electromechanics, optics and optomechanics. RSC 2019-08-29 /pmc/articles/PMC9419616/ /pubmed/36133542 http://dx.doi.org/10.1039/c9na00388f Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by/3.0/ |
spellingShingle | Chemistry Zhang, Qianzhe Sánchez-Fuentes, David Gómez, Andrés Desgarceaux, Rudy Charlot, Benoit Gàzquez, Jaume Carretero-Genevrier, Adrián Gich, Martí Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films |
title | Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films |
title_full | Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films |
title_fullStr | Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films |
title_full_unstemmed | Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films |
title_short | Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films |
title_sort | tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films |
topic | Chemistry |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9419616/ https://www.ncbi.nlm.nih.gov/pubmed/36133542 http://dx.doi.org/10.1039/c9na00388f |
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