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Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering
Highly durable and antimicrobial tantalum nitride/copper (TaN/Cu) nanocomposite coatings were deposited on D-9 stainless steel substrates by pulsed magnetron sputtering. The Cu content in the coating was varied in the range of 1.42–35.42 atomic % (at.%). The coatings were characterized by electron p...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9503358/ https://www.ncbi.nlm.nih.gov/pubmed/36144034 http://dx.doi.org/10.3390/mi13091411 |
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author | Elangovan, Thangavel Balasankar, Athinarayanan Arokiyaraj, Selvaraj Rajagopalan, Ramaseshan George, Rani P. Oh, Tae Hwan Kuppusami, Parasuraman Ramasundaram, Subramaniyan |
author_facet | Elangovan, Thangavel Balasankar, Athinarayanan Arokiyaraj, Selvaraj Rajagopalan, Ramaseshan George, Rani P. Oh, Tae Hwan Kuppusami, Parasuraman Ramasundaram, Subramaniyan |
author_sort | Elangovan, Thangavel |
collection | PubMed |
description | Highly durable and antimicrobial tantalum nitride/copper (TaN/Cu) nanocomposite coatings were deposited on D-9 stainless steel substrates by pulsed magnetron sputtering. The Cu content in the coating was varied in the range of 1.42–35.42 atomic % (at.%). The coatings were characterized by electron probe microanalyzer, X-ray diffraction, scanning electron microscope and atomic force microscope. The antibacterial properties of the TaN/Cu coatings against gram-negative Pseudomonas aeruginosa were evaluated using a cell culture test. The peak hardness and Young’s modulus of TaN/Cu with 10.46 at.% Cu were 24 and 295 GPa, respectively, which amounted to 15 and 41.67% higher than Cu-free TaN. Among all, TaN/Cu with 10.46 at.% exhibited the lowest friction coefficient. The TaN/Cu coatings exhibited significantly higher antibacterial activity than Cu-free TaN against Pseudomonas aeruginosa. On TaN, the bacterial count was about 4 × 10(6) CFU, whereas it was dropped to 1.2 × 10(2) CFU in case of TaN/Cu with 10.46 at.% Cu. The bacterial count was decreased from 9 to 6 when the Cu content increased from 25.54 to 30.04 at.%. Live bacterial cells were observed in the SEM images of TaN, and dead cells were found on TaN/Cu. Overall, TaN/Cu with 10.46 at.% Cu was found to be a potential coating composition in terms of higher antimicrobial activity and mechanical durability. |
format | Online Article Text |
id | pubmed-9503358 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-95033582022-09-24 Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering Elangovan, Thangavel Balasankar, Athinarayanan Arokiyaraj, Selvaraj Rajagopalan, Ramaseshan George, Rani P. Oh, Tae Hwan Kuppusami, Parasuraman Ramasundaram, Subramaniyan Micromachines (Basel) Article Highly durable and antimicrobial tantalum nitride/copper (TaN/Cu) nanocomposite coatings were deposited on D-9 stainless steel substrates by pulsed magnetron sputtering. The Cu content in the coating was varied in the range of 1.42–35.42 atomic % (at.%). The coatings were characterized by electron probe microanalyzer, X-ray diffraction, scanning electron microscope and atomic force microscope. The antibacterial properties of the TaN/Cu coatings against gram-negative Pseudomonas aeruginosa were evaluated using a cell culture test. The peak hardness and Young’s modulus of TaN/Cu with 10.46 at.% Cu were 24 and 295 GPa, respectively, which amounted to 15 and 41.67% higher than Cu-free TaN. Among all, TaN/Cu with 10.46 at.% exhibited the lowest friction coefficient. The TaN/Cu coatings exhibited significantly higher antibacterial activity than Cu-free TaN against Pseudomonas aeruginosa. On TaN, the bacterial count was about 4 × 10(6) CFU, whereas it was dropped to 1.2 × 10(2) CFU in case of TaN/Cu with 10.46 at.% Cu. The bacterial count was decreased from 9 to 6 when the Cu content increased from 25.54 to 30.04 at.%. Live bacterial cells were observed in the SEM images of TaN, and dead cells were found on TaN/Cu. Overall, TaN/Cu with 10.46 at.% Cu was found to be a potential coating composition in terms of higher antimicrobial activity and mechanical durability. MDPI 2022-08-27 /pmc/articles/PMC9503358/ /pubmed/36144034 http://dx.doi.org/10.3390/mi13091411 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Elangovan, Thangavel Balasankar, Athinarayanan Arokiyaraj, Selvaraj Rajagopalan, Ramaseshan George, Rani P. Oh, Tae Hwan Kuppusami, Parasuraman Ramasundaram, Subramaniyan Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering |
title | Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering |
title_full | Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering |
title_fullStr | Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering |
title_full_unstemmed | Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering |
title_short | Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering |
title_sort | highly durable antimicrobial tantalum nitride/copper coatings on stainless steel deposited by pulsed magnetron sputtering |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9503358/ https://www.ncbi.nlm.nih.gov/pubmed/36144034 http://dx.doi.org/10.3390/mi13091411 |
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