Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations

Focused ion beams (FIB) are a common tool in nanotechnology for surface analysis, sample preparation for electron microscopy and atom probe tomography, surface patterning, nanolithography, nanomachining, and nanoprinting. For many of these applications, a precise control of ion-beam-induced processe...

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Detalles Bibliográficos
Autores principales: Defoort-Levkov, Grégoire R N, Bahm, Alan, Philipp, Patrick
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2022
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9520830/
https://www.ncbi.nlm.nih.gov/pubmed/36225852
http://dx.doi.org/10.3762/bjnano.13.86

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9520830/
https://www.ncbi.nlm.nih.gov/pubmed/36225852
http://dx.doi.org/10.3762/bjnano.13.86

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