Cargando…

Study of the ordered assembly morphologies of diblock copolymers on the same substrate

With the development of frontier technology in emerging semiconductor processes, self-assembling (SA) and directed self-assembly (DSA) of block copolymers (BCPs) have attracted great attention from scientific researchers and become promising candidates for advanced photolithography. Using an optimal...

Descripción completa

Detalles Bibliográficos
Autores principales: Zhang, Baolin, Meng, Lingkuan, Li, Zili
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9533419/
https://www.ncbi.nlm.nih.gov/pubmed/36320541
http://dx.doi.org/10.1039/d2ra04803e

Ejemplares similares