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Influence of Surface Roughness on the Dynamics and Crystallization of Vapor-Deposited Thin Films

[Image: see text] The substrate roughness is a very important parameter that can influence the properties of supported thin films. In this work, we investigate the effect of surface roughness on the properties of a vapor-deposited glass (celecoxib, CXB) both in its bulk and in confined states. Using...

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Detalles Bibliográficos
Autores principales: Beena Unni, Aparna, Winkler, Roksana, Duarte, Daniel Marques, Chat, Katarzyna, Adrjanowicz, Karolina
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9574919/
https://www.ncbi.nlm.nih.gov/pubmed/36170644
http://dx.doi.org/10.1021/acs.jpcb.2c04541
Descripción
Sumario:[Image: see text] The substrate roughness is a very important parameter that can influence the properties of supported thin films. In this work, we investigate the effect of surface roughness on the properties of a vapor-deposited glass (celecoxib, CXB) both in its bulk and in confined states. Using dielectric spectroscopy, we provide experimental evidence depicting a profound influence of surface roughness on the α-relaxation dynamics and the isothermal crystallization of this vapor-deposited glass. Besides, we have verified the influence of film confinement on varying values of surface roughnesses as well. At a fixed surface roughness value, the confinement could alter both the dynamics and crystallization of vapor-deposited CXB.