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Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes
In the past decade, aluminum scandium nitride (AlScN) with a high Sc content has shown ferroelectric properties, which provides a new option for CMOS-process-compatible ferroelectric memory, sensors and actuators, as well as tunable devices. In this paper, the ferroelectric properties of [Formula: s...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9607415/ https://www.ncbi.nlm.nih.gov/pubmed/36295981 http://dx.doi.org/10.3390/mi13101629 |
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author | Nie, Ran Shao, Shuai Luo, Zhifang Kang, Xiaoxu Wu, Tao |
author_facet | Nie, Ran Shao, Shuai Luo, Zhifang Kang, Xiaoxu Wu, Tao |
author_sort | Nie, Ran |
collection | PubMed |
description | In the past decade, aluminum scandium nitride (AlScN) with a high Sc content has shown ferroelectric properties, which provides a new option for CMOS-process-compatible ferroelectric memory, sensors and actuators, as well as tunable devices. In this paper, the ferroelectric properties of [Formula: see text] grown on different metals were studied. The effect of metal and abnormal orientation grains (AOGs) on ferroelectric properties was observed. A coercive field of approximately 3 MV/cm and a large remanent polarization of more than 100 μC/cm(2) were exhibited on the Pt surface. The [Formula: see text] thin film grown on the Mo metal surface exhibited a large leakage current. We analyzed the leakage current of [Formula: see text] during polarization with the polarization frequency, and found that the [Formula: see text] films grown on either Pt or Mo surfaces have large leakage currents at frequencies below 5 kHz. The leakage current decreases significantly as the frequency approaches 10 kHz. The positive up negative down (PUND) measurement was used to obtain the remanent polarization of the films, and it was found that the remanent polarization values were not the same in the positive and negative directions, indicating that the electrode material has an effect on the ferroelectric properties. |
format | Online Article Text |
id | pubmed-9607415 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-96074152022-10-28 Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes Nie, Ran Shao, Shuai Luo, Zhifang Kang, Xiaoxu Wu, Tao Micromachines (Basel) Article In the past decade, aluminum scandium nitride (AlScN) with a high Sc content has shown ferroelectric properties, which provides a new option for CMOS-process-compatible ferroelectric memory, sensors and actuators, as well as tunable devices. In this paper, the ferroelectric properties of [Formula: see text] grown on different metals were studied. The effect of metal and abnormal orientation grains (AOGs) on ferroelectric properties was observed. A coercive field of approximately 3 MV/cm and a large remanent polarization of more than 100 μC/cm(2) were exhibited on the Pt surface. The [Formula: see text] thin film grown on the Mo metal surface exhibited a large leakage current. We analyzed the leakage current of [Formula: see text] during polarization with the polarization frequency, and found that the [Formula: see text] films grown on either Pt or Mo surfaces have large leakage currents at frequencies below 5 kHz. The leakage current decreases significantly as the frequency approaches 10 kHz. The positive up negative down (PUND) measurement was used to obtain the remanent polarization of the films, and it was found that the remanent polarization values were not the same in the positive and negative directions, indicating that the electrode material has an effect on the ferroelectric properties. MDPI 2022-09-28 /pmc/articles/PMC9607415/ /pubmed/36295981 http://dx.doi.org/10.3390/mi13101629 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Nie, Ran Shao, Shuai Luo, Zhifang Kang, Xiaoxu Wu, Tao Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes |
title | Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes |
title_full | Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes |
title_fullStr | Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes |
title_full_unstemmed | Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes |
title_short | Characterization of Ferroelectric Al(0.7)Sc(0.3)N Thin Film on Pt and Mo Electrodes |
title_sort | characterization of ferroelectric al(0.7)sc(0.3)n thin film on pt and mo electrodes |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9607415/ https://www.ncbi.nlm.nih.gov/pubmed/36295981 http://dx.doi.org/10.3390/mi13101629 |
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