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On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Selective, nanometer-thin organosilica layers created by plasma-enhanced chemical vapor deposition (PECVD) exhibit selective gas permeation behavior. Despite their promising pure gas performance, published data with regard to mixed gas behavior are still severely lacking. This study endeavors to clo...

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Detalles Bibliográficos
Autores principales:	Rubner, Jens, Skribbe, Soukaina, Roth, Hannah, Kleines, Lara, Dahlmann, Rainer, Wessling, Matthias
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2022
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9609601/ https://www.ncbi.nlm.nih.gov/pubmed/36295753 http://dx.doi.org/10.3390/membranes12100994

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