High Rate Deposition of Piezoelectric AlScN Films by Reactive Magnetron Sputtering from AlSc Alloy Targets on Large Area

This paper reports on the deposition and characterization of piezoelectric Al(X)Sc(1-X)N (further: AlScN) films on Si substrates using AlSc alloy targets with 30 at.% Sc. Films were deposited on a Ø200 mm area with deposition rates of 200 nm/min using a reactive magnetron sputtering process with a u...

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Detalles Bibliográficos
Autores principales: Barth, Stephan, Schreiber, Tom, Cornelius, Steffen, Zywitzki, Olaf, Modes, Thomas, Bartzsch, Hagen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9610784/
https://www.ncbi.nlm.nih.gov/pubmed/36295914
http://dx.doi.org/10.3390/mi13101561

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9610784/
https://www.ncbi.nlm.nih.gov/pubmed/36295914
http://dx.doi.org/10.3390/mi13101561

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