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Design of Reflective Polarization Rotator in Silicon Waveguide

In this work, we investigate theoretically the reflective polarization rotator in a silicon waveguide formed by periodically arranged rectangular air holes. The etched air holes generate the large birefringence for the waveguide. The effective refractive index of the non-etched waveguide is isotropi...

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Autores principales: Liu, Li-Ying, Huang, Hong-Chang, Chen, Chu-Wen, Hsiao, Fu-Li, Cheng, Yu-Chieh, Chen, Chii-Chang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9611908/
https://www.ncbi.nlm.nih.gov/pubmed/36296883
http://dx.doi.org/10.3390/nano12203694
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author Liu, Li-Ying
Huang, Hong-Chang
Chen, Chu-Wen
Hsiao, Fu-Li
Cheng, Yu-Chieh
Chen, Chii-Chang
author_facet Liu, Li-Ying
Huang, Hong-Chang
Chen, Chu-Wen
Hsiao, Fu-Li
Cheng, Yu-Chieh
Chen, Chii-Chang
author_sort Liu, Li-Ying
collection PubMed
description In this work, we investigate theoretically the reflective polarization rotator in a silicon waveguide formed by periodically arranged rectangular air holes. The etched air holes generate the large birefringence for the waveguide. The effective refractive index of the non-etched waveguide is isotropic. The structure can be regarded as a stack of alternating birefringent waveplates and isotropic material similar to the folded Šolc filter. The band structure of the stack of birefringent waveplates with isotropic background is calculated to confirm the fact that high reflection peaks in the reflection spectra of the waveguide result from the photonic bandgap. The polarization extinction ratio for the reflected light is 15.8 dB. The highest reflectivity of the device is 93.1%, and the device length is 9.21 μm. An ultra-wide operation bandwidth from 1450.3 to 1621.8 nm can be achieved.
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spelling pubmed-96119082022-10-28 Design of Reflective Polarization Rotator in Silicon Waveguide Liu, Li-Ying Huang, Hong-Chang Chen, Chu-Wen Hsiao, Fu-Li Cheng, Yu-Chieh Chen, Chii-Chang Nanomaterials (Basel) Article In this work, we investigate theoretically the reflective polarization rotator in a silicon waveguide formed by periodically arranged rectangular air holes. The etched air holes generate the large birefringence for the waveguide. The effective refractive index of the non-etched waveguide is isotropic. The structure can be regarded as a stack of alternating birefringent waveplates and isotropic material similar to the folded Šolc filter. The band structure of the stack of birefringent waveplates with isotropic background is calculated to confirm the fact that high reflection peaks in the reflection spectra of the waveguide result from the photonic bandgap. The polarization extinction ratio for the reflected light is 15.8 dB. The highest reflectivity of the device is 93.1%, and the device length is 9.21 μm. An ultra-wide operation bandwidth from 1450.3 to 1621.8 nm can be achieved. MDPI 2022-10-21 /pmc/articles/PMC9611908/ /pubmed/36296883 http://dx.doi.org/10.3390/nano12203694 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Liu, Li-Ying
Huang, Hong-Chang
Chen, Chu-Wen
Hsiao, Fu-Li
Cheng, Yu-Chieh
Chen, Chii-Chang
Design of Reflective Polarization Rotator in Silicon Waveguide
title Design of Reflective Polarization Rotator in Silicon Waveguide
title_full Design of Reflective Polarization Rotator in Silicon Waveguide
title_fullStr Design of Reflective Polarization Rotator in Silicon Waveguide
title_full_unstemmed Design of Reflective Polarization Rotator in Silicon Waveguide
title_short Design of Reflective Polarization Rotator in Silicon Waveguide
title_sort design of reflective polarization rotator in silicon waveguide
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9611908/
https://www.ncbi.nlm.nih.gov/pubmed/36296883
http://dx.doi.org/10.3390/nano12203694
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