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Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device
Gallium nitride high electron mobility transistor (GaN HEMT) devices have become critical components in the manufacturing of high-performance radio frequency (RF) or power electronic modules due to their superior characteristics, such as high electron saturation speeds and high power densities. Howe...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
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Nature Publishing Group UK
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9649738/ https://www.ncbi.nlm.nih.gov/pubmed/36389055 http://dx.doi.org/10.1038/s41378-022-00462-3 |
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author | Lian, Tingting Xia, Yanming Wang, Zhizheng Yang, Xiaofeng Fu, Zhiwei Kong, Xin Lin, Shuxun Ma, Shenglin |
author_facet | Lian, Tingting Xia, Yanming Wang, Zhizheng Yang, Xiaofeng Fu, Zhiwei Kong, Xin Lin, Shuxun Ma, Shenglin |
author_sort | Lian, Tingting |
collection | PubMed |
description | Gallium nitride high electron mobility transistor (GaN HEMT) devices have become critical components in the manufacturing of high-performance radio frequency (RF) or power electronic modules due to their superior characteristics, such as high electron saturation speeds and high power densities. However, the high heat characteristics of GaN HEMTs make device level cooling a critical problem to solve since performance degradation or even failure may occur under high temperatures. In this paper, we proposed a 2.5D integration method with device-level microchannel direct cooling for a high-power GaN HEMT device. To demonstrate this technological concept, a multigate GaN HEMT device featuring a gate length/width/source drain spacing of 0.5 μm/300 μm/6 μm that underwent in-house backside thinning and metallization was used as the test vehicle. A high-resistivity silicon (HR Si) interposer embedded with four-layer microchannels was designed, having widths/pitches of 30 μm/30 μm at the top microchannel. The high-power GaN HEMT device was soldered on a Si interposer embedded with open microchannels for heat dissipation. A pair of GSG Pad chips was soldered simultaneously to display the capacity for the heterogeneous integration of other chip types. Thermal property evaluation was conducted with experiments and simulations. The test results showed that the maximum surface temperature of the GaN HEMT device decreased to 93.8 °C when it experienced a heat dissipation density of 32 kW/cm(2) in the gate finger area and an average heat dissipation density of 5 kW/cm(2) was found in the active area with the DI water coolant at a flow rate of 3 mL/min. To our knowledge, among recently reported works, this finding was the best cooling capacity of heterogeneously integrated microchannels for GaN HEMT devices. In addition, this technology was scalable regarding the numbers of gate fingers or GaN HEMT devices. |
format | Online Article Text |
id | pubmed-9649738 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-96497382022-11-15 Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device Lian, Tingting Xia, Yanming Wang, Zhizheng Yang, Xiaofeng Fu, Zhiwei Kong, Xin Lin, Shuxun Ma, Shenglin Microsyst Nanoeng Article Gallium nitride high electron mobility transistor (GaN HEMT) devices have become critical components in the manufacturing of high-performance radio frequency (RF) or power electronic modules due to their superior characteristics, such as high electron saturation speeds and high power densities. However, the high heat characteristics of GaN HEMTs make device level cooling a critical problem to solve since performance degradation or even failure may occur under high temperatures. In this paper, we proposed a 2.5D integration method with device-level microchannel direct cooling for a high-power GaN HEMT device. To demonstrate this technological concept, a multigate GaN HEMT device featuring a gate length/width/source drain spacing of 0.5 μm/300 μm/6 μm that underwent in-house backside thinning and metallization was used as the test vehicle. A high-resistivity silicon (HR Si) interposer embedded with four-layer microchannels was designed, having widths/pitches of 30 μm/30 μm at the top microchannel. The high-power GaN HEMT device was soldered on a Si interposer embedded with open microchannels for heat dissipation. A pair of GSG Pad chips was soldered simultaneously to display the capacity for the heterogeneous integration of other chip types. Thermal property evaluation was conducted with experiments and simulations. The test results showed that the maximum surface temperature of the GaN HEMT device decreased to 93.8 °C when it experienced a heat dissipation density of 32 kW/cm(2) in the gate finger area and an average heat dissipation density of 5 kW/cm(2) was found in the active area with the DI water coolant at a flow rate of 3 mL/min. To our knowledge, among recently reported works, this finding was the best cooling capacity of heterogeneously integrated microchannels for GaN HEMT devices. In addition, this technology was scalable regarding the numbers of gate fingers or GaN HEMT devices. Nature Publishing Group UK 2022-11-11 /pmc/articles/PMC9649738/ /pubmed/36389055 http://dx.doi.org/10.1038/s41378-022-00462-3 Text en © The Author(s) 2022 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) . |
spellingShingle | Article Lian, Tingting Xia, Yanming Wang, Zhizheng Yang, Xiaofeng Fu, Zhiwei Kong, Xin Lin, Shuxun Ma, Shenglin Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device |
title | Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device |
title_full | Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device |
title_fullStr | Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device |
title_full_unstemmed | Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device |
title_short | Thermal property evaluation of a 2.5D integration method with device level microchannel direct cooling for a high-power GaN HEMT device |
title_sort | thermal property evaluation of a 2.5d integration method with device level microchannel direct cooling for a high-power gan hemt device |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9649738/ https://www.ncbi.nlm.nih.gov/pubmed/36389055 http://dx.doi.org/10.1038/s41378-022-00462-3 |
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