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The Effects of Precursors on the Morphology and Chemical Mechanical Polishing Performance of Ceria-Based Abrasives

Ceria-based abrasives are widely used in precision chemical mechanical polishing (CMP) fields, such as thin film transistor liquid crystal display (TFT-LCD) glass substrates and integrated circuits, because of their excellent physicochemical properties. Rare earth carbonates, as precursors of ceria-...

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Detalles Bibliográficos
Autores principales:	Zheng, Yuanyuan, Wang, Ning, Feng, Zongyu, Tan, Xianmin, Zhang, Zhenyu, Han, Huiqing, Huang, Xiaowei
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2022
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9654570/ https://www.ncbi.nlm.nih.gov/pubmed/36363118 http://dx.doi.org/10.3390/ma15217525

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