All Solution-Processed Inorganic, Multilevel Memristors Utilizing Liquid Metals Electrodes Suitable for Analog Computing

[Image: see text] Herein, we report a solution-processable memristive device based on bismuth vanadate (BiVO(4)) and titanium dioxide (TiO(2)) with gallium-based eutectic gallium–indium (EGaIn) and gallium–indium-tin alloy (GaInSn) liquid metal as the top electrode. Scanning electron microscopy (SEM) shows the formation of a nonporous structure of BiVO(4) and TiO(2) for efficient resistive switching. Additionally, the gallium-based liquid metal (GLM)-contacted memristors exhibit stable memristor behavior over a wide temperature range from −10 to +90 °C. Gallium atoms in the liquid metal play an important role in the conductive filament formation as well as the device’s operation stability as elucidated by I–V characteristics. The synaptic behavior of the GLM-memristors was characterized, with excellent long-term potentiation (LTP) and long-term depression (LTD) linearity. Using the performance of our device in a multilayer perceptron (MLP) network, a ∼90% accuracy in the handwriting recognition of modified national institute of standards and technology database (MNIST) was achieved. Our findings pave a path for solution-processed/GLM-based memristors which can be used in neuromorphic applications on flexible substrates in a harsh environment.