Electrical Performance of 28 nm-Node Varying Channel-Width nMOSFETs under DPN Process Treatments

The decoupled-plasma nitridation treatment process is an effective recipe for repairing the trap issues when depositing high-k gate dielectric. Because of this effect, electrical performance is not only increased with the relative dielectric constant, but there is also a reduction in gate leakage. I...

Descripción completa

Detalles Bibliográficos
Autores principales: Chao, Shou-Yen, Lan, Wen-How, Fan, Shou-Kong, Zhon, Zi-Wen, Wang, Mu-Chun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9697109/
https://www.ncbi.nlm.nih.gov/pubmed/36363881
http://dx.doi.org/10.3390/mi13111861

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9697109/
https://www.ncbi.nlm.nih.gov/pubmed/36363881
http://dx.doi.org/10.3390/mi13111861

Ejemplares similares