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Electrical Performance of 28 nm-Node Varying Channel-Width nMOSFETs under DPN Process Treatments
The decoupled-plasma nitridation treatment process is an effective recipe for repairing the trap issues when depositing high-k gate dielectric. Because of this effect, electrical performance is not only increased with the relative dielectric constant, but there is also a reduction in gate leakage. I...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9697109/ https://www.ncbi.nlm.nih.gov/pubmed/36363881 http://dx.doi.org/10.3390/mi13111861 |