Cargando…
Author Correction: Multilayer redox-based HfO(x)/Al(2)O(3)/TiO(2) memristive structures for neuromorphic computing
Autores principales: | Park, Seongae, Spetzler, Benjamin, Ivanov, Tzvetan, Ziegler, Martin |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9723096/ https://www.ncbi.nlm.nih.gov/pubmed/36470942 http://dx.doi.org/10.1038/s41598-022-25502-w |
Ejemplares similares
-
Multilayer redox-based HfO(x)/Al(2)O(3)/TiO(2) memristive structures for neuromorphic computing
por: Park, Seongae, et al.
Publicado: (2022) -
TiN/Ti/HfO(2)/TiN memristive devices for neuromorphic computing: from synaptic plasticity to stochastic resonance
por: Maldonado, David, et al.
Publicado: (2023) -
HfO(x)/AlO(y) Superlattice‐Like Memristive Synapse
por: Wang, Chengxu, et al.
Publicado: (2022) -
Improved resistive switching characteristics of a multi-stacked HfO(2)/Al(2)O(3)/HfO(2) RRAM structure for neuromorphic and synaptic applications: experimental and computational study
por: Khera, Ejaz Ahmad, et al.
Publicado: (2022) -
Bipolar Resistive Switching Characteristics of HfO(2)/TiO(2)/HfO(2) Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
por: Zhang, Wei, et al.
Publicado: (2017)