Solid-State Reaction in Cu/a-Si Nanolayers: A Comparative Study of STA and Electron Diffraction Data

The kinetics of the solid-state reaction between nanolayers of polycrystalline copper and amorphous silicon (a-Si) has been studied in a Cu/a-Si thin-film system by the methods of electron diffraction and simultaneous thermal analysis (STA), including the methods of differential scanning calorimetry...

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Detalles Bibliográficos
Autores principales: Moiseenko, Evgeny T., Yumashev, Vladimir V., Altunin, Roman R., Zeer, Galina M., Nikolaeva, Nataliya S., Belousov, Oleg V., Zharkov, Sergey M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9740275/
https://www.ncbi.nlm.nih.gov/pubmed/36499953
http://dx.doi.org/10.3390/ma15238457

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9740275/
https://www.ncbi.nlm.nih.gov/pubmed/36499953
http://dx.doi.org/10.3390/ma15238457

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