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Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water

Detalles Bibliográficos
Autores principales: Xu, Rui, Zhou, Zhongchao, Li, Jing, Zhang, Xu, Zhu, Yuanyuan, Xiao, Hongping, Xu, Lina, Ding, Yihong, Li, Aidong, Fang, Guoyong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Frontiers Media S.A. 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9808819/
https://www.ncbi.nlm.nih.gov/pubmed/36605119
http://dx.doi.org/10.3389/fchem.2022.1118819
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author Xu, Rui
Zhou, Zhongchao
Li, Jing
Zhang, Xu
Zhu, Yuanyuan
Xiao, Hongping
Xu, Lina
Ding, Yihong
Li, Aidong
Fang, Guoyong
author_facet Xu, Rui
Zhou, Zhongchao
Li, Jing
Zhang, Xu
Zhu, Yuanyuan
Xiao, Hongping
Xu, Lina
Ding, Yihong
Li, Aidong
Fang, Guoyong
author_sort Xu, Rui
collection PubMed
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spelling pubmed-98088192023-01-04 Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water Xu, Rui Zhou, Zhongchao Li, Jing Zhang, Xu Zhu, Yuanyuan Xiao, Hongping Xu, Lina Ding, Yihong Li, Aidong Fang, Guoyong Front Chem Chemistry Frontiers Media S.A. 2022-12-20 /pmc/articles/PMC9808819/ /pubmed/36605119 http://dx.doi.org/10.3389/fchem.2022.1118819 Text en Copyright © 2022 Xu, Zhou, Li, Zhang, Zhu, Xiao, Xu, Ding, Li and Fang. https://creativecommons.org/licenses/by/4.0/This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) and the copyright owner(s) are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.
spellingShingle Chemistry
Xu, Rui
Zhou, Zhongchao
Li, Jing
Zhang, Xu
Zhu, Yuanyuan
Xiao, Hongping
Xu, Lina
Ding, Yihong
Li, Aidong
Fang, Guoyong
Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
title Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
title_full Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
title_fullStr Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
title_full_unstemmed Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
title_short Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
title_sort corrigendum: reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9808819/
https://www.ncbi.nlm.nih.gov/pubmed/36605119
http://dx.doi.org/10.3389/fchem.2022.1118819
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