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Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
Autores principales: | , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Frontiers Media S.A.
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9808819/ https://www.ncbi.nlm.nih.gov/pubmed/36605119 http://dx.doi.org/10.3389/fchem.2022.1118819 |
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author | Xu, Rui Zhou, Zhongchao Li, Jing Zhang, Xu Zhu, Yuanyuan Xiao, Hongping Xu, Lina Ding, Yihong Li, Aidong Fang, Guoyong |
author_facet | Xu, Rui Zhou, Zhongchao Li, Jing Zhang, Xu Zhu, Yuanyuan Xiao, Hongping Xu, Lina Ding, Yihong Li, Aidong Fang, Guoyong |
author_sort | Xu, Rui |
collection | PubMed |
description | |
format | Online Article Text |
id | pubmed-9808819 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | Frontiers Media S.A. |
record_format | MEDLINE/PubMed |
spelling | pubmed-98088192023-01-04 Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water Xu, Rui Zhou, Zhongchao Li, Jing Zhang, Xu Zhu, Yuanyuan Xiao, Hongping Xu, Lina Ding, Yihong Li, Aidong Fang, Guoyong Front Chem Chemistry Frontiers Media S.A. 2022-12-20 /pmc/articles/PMC9808819/ /pubmed/36605119 http://dx.doi.org/10.3389/fchem.2022.1118819 Text en Copyright © 2022 Xu, Zhou, Li, Zhang, Zhu, Xiao, Xu, Ding, Li and Fang. https://creativecommons.org/licenses/by/4.0/This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) and the copyright owner(s) are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms. |
spellingShingle | Chemistry Xu, Rui Zhou, Zhongchao Li, Jing Zhang, Xu Zhu, Yuanyuan Xiao, Hongping Xu, Lina Ding, Yihong Li, Aidong Fang, Guoyong Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water |
title | Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water |
title_full | Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water |
title_fullStr | Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water |
title_full_unstemmed | Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water |
title_short | Corrigendum: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water |
title_sort | corrigendum: reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water |
topic | Chemistry |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9808819/ https://www.ncbi.nlm.nih.gov/pubmed/36605119 http://dx.doi.org/10.3389/fchem.2022.1118819 |
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