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Effect of N doping on the microstructure and dry etch properties of amorphous carbon deposited with a DC sputtering system
The importance of developing a hardmask with excellent performance, and physical and chemical properties to utilize in long-term etching is spotlighted due to the acceleration of development in high-density semiconductors. To develop such a hardmask, amorphous carbon hardmasks doped with various con...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9835153/ https://www.ncbi.nlm.nih.gov/pubmed/36712610 http://dx.doi.org/10.1039/d2ra06808g |