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Meta-Learned and TCAD-Assisted Sampling in Semiconductor Laser Annealing
[Image: see text] While applying machine learning (ML) to semiconductor manufacturing is prevalent, an efficient way to sample the search space has not been explored much in key processes such as lithography, annealing, deposition, and etching. The aim is to use the fewest experimental trials to con...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2022
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9836362/ https://www.ncbi.nlm.nih.gov/pubmed/36643440 http://dx.doi.org/10.1021/acsomega.2c06000 |