Cargando…

General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials

Most of the current methods for the synthesis of two-dimensional materials (2DMs) require temperatures not compatible with traditional back-end-of-line (BEOL) processes in semiconductor industry (450 °C). Here, we report a general BiOCl-assisted chemical vapor deposition (CVD) approach for the low-t...

Descripción completa

Detalles Bibliográficos
Autores principales: Qin, Biao, Saeed, Muhammad Zeeshan, Li, Qiuqiu, Zhu, Manli, Feng, Ya, Zhou, Ziqi, Fang, Jingzhi, Hossain, Mongur, Zhang, Zucheng, Zhou, Yucheng, Huangfu, Ying, Song, Rong, Tang, Jingmei, Li, Bailing, Liu, Jialing, Wang, Di, He, Kun, Zhang, Hongmei, Wu, Ruixia, Zhao, Bei, Li, Jia, Liao, Lei, Wei, Zhongming, Li, Bo, Duan, Xiangfeng, Duan, Xidong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9852450/
https://www.ncbi.nlm.nih.gov/pubmed/36658123
http://dx.doi.org/10.1038/s41467-023-35983-6
_version_ 1784872634722287616
author Qin, Biao
Saeed, Muhammad Zeeshan
Li, Qiuqiu
Zhu, Manli
Feng, Ya
Zhou, Ziqi
Fang, Jingzhi
Hossain, Mongur
Zhang, Zucheng
Zhou, Yucheng
Huangfu, Ying
Song, Rong
Tang, Jingmei
Li, Bailing
Liu, Jialing
Wang, Di
He, Kun
Zhang, Hongmei
Wu, Ruixia
Zhao, Bei
Li, Jia
Liao, Lei
Wei, Zhongming
Li, Bo
Duan, Xiangfeng
Duan, Xidong
author_facet Qin, Biao
Saeed, Muhammad Zeeshan
Li, Qiuqiu
Zhu, Manli
Feng, Ya
Zhou, Ziqi
Fang, Jingzhi
Hossain, Mongur
Zhang, Zucheng
Zhou, Yucheng
Huangfu, Ying
Song, Rong
Tang, Jingmei
Li, Bailing
Liu, Jialing
Wang, Di
He, Kun
Zhang, Hongmei
Wu, Ruixia
Zhao, Bei
Li, Jia
Liao, Lei
Wei, Zhongming
Li, Bo
Duan, Xiangfeng
Duan, Xidong
author_sort Qin, Biao
collection PubMed
description Most of the current methods for the synthesis of two-dimensional materials (2DMs) require temperatures not compatible with traditional back-end-of-line (BEOL) processes in semiconductor industry (450 °C). Here, we report a general BiOCl-assisted chemical vapor deposition (CVD) approach for the low-temperature synthesis of 27 ultrathin 2DMs. In particular, by mixing BiOCl with selected metal powders to produce volatile intermediates, we show that ultrathin 2DMs can be produced at 280–500 °C, which are ~200–300 °C lower than the temperatures required for salt-assisted CVD processes. In-depth characterizations and theoretical calculations reveal the low-temperature processes promoting 2D growth and the oxygen-inhibited synthetic mechanism ensuring the formation of ultrathin nonlayered 2DMs. We demonstrate that the resulting 2DMs exhibit electrical, magnetic and optoelectronic properties comparable to those of 2DMs grown at much higher temperatures. The general low-temperature preparation of ultrathin 2DMs defines a rich material platform for exploring exotic physics and facile BEOL integration in semiconductor industry.
format Online
Article
Text
id pubmed-9852450
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher Nature Publishing Group UK
record_format MEDLINE/PubMed
spelling pubmed-98524502023-01-21 General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials Qin, Biao Saeed, Muhammad Zeeshan Li, Qiuqiu Zhu, Manli Feng, Ya Zhou, Ziqi Fang, Jingzhi Hossain, Mongur Zhang, Zucheng Zhou, Yucheng Huangfu, Ying Song, Rong Tang, Jingmei Li, Bailing Liu, Jialing Wang, Di He, Kun Zhang, Hongmei Wu, Ruixia Zhao, Bei Li, Jia Liao, Lei Wei, Zhongming Li, Bo Duan, Xiangfeng Duan, Xidong Nat Commun Article Most of the current methods for the synthesis of two-dimensional materials (2DMs) require temperatures not compatible with traditional back-end-of-line (BEOL) processes in semiconductor industry (450 °C). Here, we report a general BiOCl-assisted chemical vapor deposition (CVD) approach for the low-temperature synthesis of 27 ultrathin 2DMs. In particular, by mixing BiOCl with selected metal powders to produce volatile intermediates, we show that ultrathin 2DMs can be produced at 280–500 °C, which are ~200–300 °C lower than the temperatures required for salt-assisted CVD processes. In-depth characterizations and theoretical calculations reveal the low-temperature processes promoting 2D growth and the oxygen-inhibited synthetic mechanism ensuring the formation of ultrathin nonlayered 2DMs. We demonstrate that the resulting 2DMs exhibit electrical, magnetic and optoelectronic properties comparable to those of 2DMs grown at much higher temperatures. The general low-temperature preparation of ultrathin 2DMs defines a rich material platform for exploring exotic physics and facile BEOL integration in semiconductor industry. Nature Publishing Group UK 2023-01-19 /pmc/articles/PMC9852450/ /pubmed/36658123 http://dx.doi.org/10.1038/s41467-023-35983-6 Text en © The Author(s) 2023 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Article
Qin, Biao
Saeed, Muhammad Zeeshan
Li, Qiuqiu
Zhu, Manli
Feng, Ya
Zhou, Ziqi
Fang, Jingzhi
Hossain, Mongur
Zhang, Zucheng
Zhou, Yucheng
Huangfu, Ying
Song, Rong
Tang, Jingmei
Li, Bailing
Liu, Jialing
Wang, Di
He, Kun
Zhang, Hongmei
Wu, Ruixia
Zhao, Bei
Li, Jia
Liao, Lei
Wei, Zhongming
Li, Bo
Duan, Xiangfeng
Duan, Xidong
General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials
title General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials
title_full General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials
title_fullStr General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials
title_full_unstemmed General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials
title_short General low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials
title_sort general low-temperature growth of two-dimensional nanosheets from layered and nonlayered materials
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9852450/
https://www.ncbi.nlm.nih.gov/pubmed/36658123
http://dx.doi.org/10.1038/s41467-023-35983-6
work_keys_str_mv AT qinbiao generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT saeedmuhammadzeeshan generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT liqiuqiu generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT zhumanli generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT fengya generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT zhouziqi generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT fangjingzhi generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT hossainmongur generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT zhangzucheng generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT zhouyucheng generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT huangfuying generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT songrong generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT tangjingmei generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT libailing generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT liujialing generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT wangdi generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT hekun generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT zhanghongmei generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT wuruixia generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT zhaobei generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT lijia generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT liaolei generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT weizhongming generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT libo generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT duanxiangfeng generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials
AT duanxidong generallowtemperaturegrowthoftwodimensionalnanosheetsfromlayeredandnonlayeredmaterials